Nanoscale freestanding gratings for ultraviolet blocking filters

被引：19
作者：
van Beek, JTM
Fleming, RC
Hindle, PS
Prentiss, JD
Schattenburg, ML
Ritzau, S
机构：
[1] MIT, Cambridge, MA 02139 USA
[2] Univ Calif Los Alamos Natl Lab, Los Alamos, NM 87545 USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 06期
关键词：
D O I：
10.1116/1.590434
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Ultraviolet (UV) blocking filters are needed for atomic flux imaging in environments where high levels of ultraviolet radiation are present. Freestanding gratings are a promising candidate for UV filtering. They have a high aspect ratio (similar to 13), narrow (similar to 40 nm) slots, and effectively block UV radiation. The grating fabrication process makes use of several etching, electroplating, and lithographic steps and includes an optional step to plug pinholes induced by particles during processing. Gratings were-successfully manufactured and tested. Measured UV transmissions of similar to 10(-5) and particle transmissions of similar to 10% are in agreement with theoretical predictions. (C) 1998 American Vacuum Society. [S0734-211X(98)03806-2].
引用
收藏
页码：3911 / 3916
页数：6
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