Collapse of stamps for soft lithography due to interfacial adhesion

被引:95
作者
Hsia, KJ [1 ]
Huang, Y
Menard, E
Park, JU
Zhou, W
Rogers, J
Fulton, JM
机构
[1] Univ Illinois, Dept Theoret & Appl Mech, Urbana, IL 61801 USA
[2] Univ Illinois, Dept Mech & Ind Engn, Urbana, IL 61801 USA
[3] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA
[4] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA
[5] Univ Illinois, Beckman Inst, Urbana, IL 61801 USA
[6] Univ Illinois, Dept Chem, Urbana, IL 61801 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.1900303
中图分类号
O59 [应用物理学];
学科分类号
摘要
Collapse of elastomeric elements used for pattern transfer in soft lithography is studied through experimental measurements and theoretical modehng. The objective is to identify the driving force for such collapse. Two potential driving forces, the self-weight of the stamp and the interfacial adhesion, are investigated. An idealized configuration of periodic rectangular grooves and flat punches is considered. Experimental observations demonstrate that groove collapse occurs regardless of whether the gravitational force promotes or suppresses such collapse, indicating that self-weight is not the driving force. On the other hand, model predictions based on the postulation that interfacial adhesion is the driving force exhibit excellent agreement with the experimentally measured collapse behavior. The interfacial adhesion energy is also evaluated by matching an adhesion parameter in the model with the experimental data. (C) 2005 American Institute of Physics.
引用
收藏
页码:1 / 3
页数:3
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