Effect of Ti ion implantation on the impedance properties of anodic oxide film on aluminum

被引：0

作者：

Tian, LP ^{[1
]}

Zuo, Y ^{[1
]}

Zhao, JM ^{[1
]}

Xiong, JP ^{[1
]}

Zhang, XF ^{[1
]}

Zhao, XH ^{[1
]}

机构：

[1] Beijing Univ Chem Technol, Sch Mat Sci & Engn, Beijing 100029, Peoples R China

来源：

ACTA METALLURGICA SINICA | 2005年 / 41卷 / 08期

关键词：

Al; anodizing; ion implantation; EIS;

D O I：

暂无

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

Commercial pure aluminum L3 was implanted by Ti ions and then anodic oxidation was carried out. Electrochemical impedance spectroscopy (EIS) and XPS were used to study the influences of Ti ion implantation on corrosion behavior of anodic oxide film in NaCl solution. XPS analysis revealed that Ti is present in the anodic film as TiO2. XRD proved that Ti ions implantation does not change the amorphous structure of the film. EIS showed that the implantation can improve the corrosion resistance of the anodic oxide films in acidic and basic solutions, and the parameters R and C in EIS increased and decreased, respectively.

引用

页码：804 / 808

页数：5

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