Direct growth of hexagonal boron nitride on non-metallic substrates and its heterostructures with graphene

被引:29
作者
Juma, Isaac G. [1 ,2 ]
Kim, Gwangwoo [3 ]
Jariwala, Deep [3 ]
Behura, Sanjay K. [1 ,2 ]
机构
[1] Univ Arkansas Pine Bluff, Dept Chem & Phys, 1200 N Univ Dr, Pine Bluff, AR 71601 USA
[2] Univ Arkansas Pine Bluff, Dept Math & Comp Sci, 1200 N Univ Dr, Pine Bluff, AR 71601 USA
[3] Univ Penn, Dept Elect & Syst Engn, Philadelphia, PA 19104 USA
基金
美国国家科学基金会;
关键词
ELECTRONIC-PROPERTIES; EPITAXIAL-GROWTH; LARGE-AREA; H-BN; MONOLAYER; TRANSPORT; STATE;
D O I
10.1016/j.isci.2021.103374
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Hexagonal boron nitride (h-BN) and its heterostructures with graphene are widely investigated van der Waals (vdW) quantum materials for electronics, photonics, sensing, and energy storage/transduction. However, their metal catalystbased growth and transfer-bases' eterostructure assembly approaches present impediments to obtaining high-quality and wafer-scale quantum material. Here, we have presented our perspective on the synthetic strategies that involve direct nucleation of h-BN on various dielectric substrates and its rieterostructures with graphene. Mechanistic understan ing of direct growth of h-BN via bottom-up approaches such as (a) the chemical-interaction guided nucleation on silicon-based dielectrics, (b) surface nitridation and N+ sputtering of h-BN target on sapphire, and (c) epitaxial growth of h-BN on sapphire, among others, are reviewed. Several design methodologies are presented for the direct growth of vertical and lateral vdW heterostructures of h-BN and graphene. These complex 2D heterostructures exhibit various physical phenomena and could potentially have a range of practical applications.
引用
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页数:19
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