Accurate masking technology for high-resolution powder blasting

被引：14
作者：
Pawlowski, AG [1 ]
Sayah, A [1 ]
Gijs, MAM [1 ]
机构：
[1] Ecole Polytech Fed Lausanne, Inst Microelect & Microsyst, CH-1015 Lausanne, Switzerland
来源：
JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 2005年 / 15卷 / 07期
关键词：
D O I：
10.1088/0960-1317/15/7/009
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We have combined eroding 10 mu m diameter Al2O3 particles with a new masking technology to realize the smallest and most accurate possible structures by powder blasting. Our masking technology is based on the sequential combination of two polymers:(i) the brittle epoxy resin SU8 for its photosensitivity and (ii) the elastic and thermocurable polydimethylsiloxane for its large erosion resistance. We have micropatterned various types of structures with a minimum width of 20 mu m for test structures with an aspect ratio of 1, and 50 mu m for test structures with an aspect ratio of 2.
引用
收藏
页码：S60 / S64
页数：5
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