Effects of SiNx interlayer on characterisation of amorphous diamond-like carbon films

被引:3
作者
Chen, Q. Y. [1 ,2 ]
Shih, K. M. [2 ]
Shen, Y. H. [1 ]
Luo, Y. [1 ]
Li, R. [1 ]
机构
[1] Southwest Univ Sci & Technol, Key Subject Lab Natl Def Radioact Waste & Environ, Mianyang 621010, Peoples R China
[2] Univ Hong Kong, Dept Civil Engn, Hong Kong, Hong Kong, Peoples R China
基金
中国国家自然科学基金;
关键词
Diamond like carbon films; Scanning electron microscopy; Raman spectra; SiNx interlayer; Magnetron sputtering; RAMAN-SPECTROSCOPY; MECHANICAL-PROPERTIES; RESIDUAL-STRESS; MICRO-RAMAN; COATINGS; SPECTRA; GROWTH; NITROGEN;
D O I
10.1179/1743284714Y.0000000646
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The magnetron sputtering amorphous diamond-like carbon film is successfully deposited by SiNx interlayer approach. The scanning electron microscopy study reveals the creation of high uniform surface micrograph diamond-like carbon films with SiNx interlayer. For comparison, diamond-like carbon films with different interlayers are also grown. The Raman spectra are analyzed in order to characterize the stressed induce peak shifts of the films. The interactions of C atom with Si(100) and SiNx surface are studied by density functional theory simulation. The effects of interlayers on the films deposition and the considering deposition mechanism are discussed. It is suggested that the diamond-like carbon and SiNx bilayer structure can help to render applications in protective coatings and high quality silicon on diamond related radiation tolerance devices.
引用
收藏
页码:703 / 708
页数:6
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