Deposition, microstructure and hardness of TiN/(Ti,Al)N multilayer films

被引：21
作者：
Zhao, Y. H. [1 ]
Hu, L. [2 ]
Lin, G. Q. [2 ]
Xiao, J. Q. [1 ]
Dong, C. [2 ]
Yu, B. H. [1 ]
机构：
[1] Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China
[2] Dalian Univ Technol, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China
来源：
INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS | 2012年 / 32卷
基金：
美国国家科学基金会;
关键词：
Pulse biased arc ion plating; TiN/(Ti; Al)N multilayer films; TEM; Hardness; MECHANICAL-PROPERTIES; THIN-FILMS; SUPERLATTICE FILMS; COATINGS; TIN; STRESS; GROWTH; PERFORMANCE; TRANSITION; MONOLAYER;
D O I：
10.1016/j.ijrmhm.2012.01.003
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this work, TiN/(Ti,Al)N multilayer films were deposited on stainless steel substrates with alternatively switching Ti and TiAl alloy targets sources on and off by pulse biased arc ion plating. The crystallography structures and cross-sectional structures of TiN/(Ti,Al)N multilayer films were evaluated by X-ray diffraction analysis (XRD) and by TEM, respectively. The hardness and film/substrate adhesion were determined by nanoindentation and scratch test, respectively. A complex set of microstructures has been found between TiN and (Ti,AI)N layers, at the interface, another layered interfacial region which consists of extremely fine sub-layers, which results from the rotation of the specimen in the deposition chamber. The hardness values of the multilayers exhibit higher hardness compared with that of monolithic (Ti,Al)N film. Crown Copyright (C) 2012 Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：27 / 32
页数：6
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