Insensitivity of Sub-Kelvin Electron-Phonon Coupling to Substrate Properties

被引:17
作者
Underwood, Jason M. [1 ]
Lowell, Peter J. [1 ]
O'Neil, Galen C. [1 ]
Ullom, Joel N. [1 ]
机构
[1] NIST, Boulder, CO 80305 USA
关键词
SCATTERING;
D O I
10.1103/PhysRevLett.107.255504
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We have examined the role of the substrate on electron-phonon coupling in normal-metal films of Mn-doped Al at temperatures below 1 K. Normal metal-insulator-superconductor junctions were used to measure the electron temperature in the films as a function of Joule heating power and phonon temperature. Theory suggests that the distribution of phonons available for interaction with electrons in metal films may depend on the acoustic properties of the substrate, namely, that the electron-phonon coupling constant Sigma would be larger on the substrate with smaller sound speed. In contrast, our results indicate that within experimental error (typically +/-10%), Sigma is unchanged among the two acoustically distinct substrates used in our investigation.
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页数:5
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