Growth of undoped GaAs single crystal by pulling-down method

被引:4
作者
Jin, Min [1 ]
Xu, Jiayue [1 ]
He, Qingbo [2 ]
Fang, Yongzheng [1 ]
Shen, Hui [1 ]
Wang, Zhanyong [1 ]
Jiang, Guojian [1 ]
机构
[1] Shanghai Inst Technol, Sch Mat Sci & Engn, Shanghai 200235, Peoples R China
[2] Hangzhou Supercrystal Photon Incorp, Hangzhou, Zhejiang 311100, Peoples R China
来源
OPTOELECTRONIC MATERIALS, PTS 1AND 2 | 2010年 / 663-665卷
关键词
Undoped GaAs; Pulling-down method; Crystal Growth; VERTICAL GRADIENT FREEZE; SEMIINSULATING GAAS; GALLIUM-ARSENIDE;
D O I
10.4028/www.scientific.net/MSF.663-665.1213
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Undoped GaAs single crystal has been grown in PBN crucibles by the pulling-down method. The temperature profile of the furnace was optimized with a narrow melting zone and a small temperature gradient at the solid-liquid interface. Quartz ampoules were used to protect the evaporation of As during the growth and the deformation of the ampoule was discussed as a function of temperature, time and pressure differential. A 056 mm X 70 mm GaAs crystal with nearly 100 % single crystalline yield was obtained. X-ray rocking curve analysis revealed the excellent crystalline quality. The average EPD and electrical properties of the crystal were tested comparable to those of the crystal produced by the VGF method. Therefore, the pulling down method was a feasible approach for GaAs crystal production.
引用
收藏
页码:1213 / +
页数:2
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