Laser beam self-focusing in photorefractive materials: Optical limiting application

被引:16
作者
Wolfersberger, D
Fressengeas, N
Maufoy, J
Kugel, G
机构
[1] Univ Metz, Lab Mat Opt Photon & Syst, F-57070 Metz, France
[2] Univ Metz, Lab Commun, F-57070 Metz, France
[3] Superlec, F-57070 Metz, France
关键词
self-focusing; photorefractive effect; pulsed laser; nanosecond scale;
D O I
10.1142/S0218863500000376
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
This paper presents a way to achieve optical limiting using the self-focusing of a laser beam in a photorefractive medium. In this view, the protection is not based on the absorption of the beam energy in the limiting system but on a global defocusing of the light in the optical system. We have studied experimentally and theoretically the self-focusing of a single laser beam in electrically biased Bi12TiO20 from the continuous to the pulsed regime. We show that photorefractive materials are, for given conditions, efficient against laser radiation on these two different time scales at a low energy level (nJ).
引用
收藏
页码:441 / 450
页数:10
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