Tailoring age hardening of Ti1-xAlxN by Ta alloying

被引：23

作者：

Grossmann, Birgit ^{[1
]}

Jamnig, Andreas ^{[1
]}

Schalk, Nina ^{[1
]}

Czettl, Christoph ^{[2
]}

Pohler, Markus ^{[2
]}

Mitterer, Christian ^{[1
]}

机构：

[1] Univ Leoben, Dept Phys Met & Mat Testing, Franz Josef Str 18, A-8700 Leoben, Austria

[2] Ceratizit Austria GmbH, Metallwerk Plansee Str 71, A-6600 Reutte, Austria

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2017年 / 35卷 / 06期

关键词：

THERMAL-STABILITY; TANTALUM-NITRIDE; OXIDATION RESISTANCE; N COATINGS; THIN-FILMS; MICROSTRUCTURE;

D O I：

10.1116/1.4995000

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The microstructure, mechanical properties, and thermal stability of arc evaporated Ti1-x-yAlxTayN hard coatings were systematically investigated by varying the Ta content in the range of 0 <= y <= 0.231. A combination of differential scanning calorimetry and vacuum annealing up to 1500 degrees C with subsequent x-ray diffraction analysis and nanoindentation measurements provided comprehensive insight into the microstructural evolution of the coatings and the resulting impact on their mechanical properties. With the addition of Ta to the metastable Ti1-xAlxN solid solution, spinodal decomposition and wurtzite phase formation are shifted to higher temperatures. Consequently, the temperature range where Ta-alloyed coatings maintain their hardness is extended up to 1000 degrees C. (C) 2017 American Vacuum Society.

引用

页数：6

共 26 条

[1] DEFECT STRUCTURE AND PHASE-TRANSITIONS IN EPITAXIAL METASTABLE CUBIC TI0.5AL0.5N ALLOYS GROWN ON MGO(001) BY ULTRA-HIGH-VACUUM MAGNETRON SPUTTER DEPOSITION [J].

ADIBI, F ;

PETROV, I ;

HULTMAN, L ;

WAHLSTROM, U ;

SHIMIZU, T ;

MCINTYRE, D ;

GREENE, JE ;

SUNDGREN, JE .

JOURNAL OF APPLIED PHYSICS, 1991, 69 (09) :6437-6450

[2] Formation of tantalum nitride films by rapid thermal processing [J].

Angelkort, C ;

Berendes, A ;

Lewalter, H ;

Bock, W ;

Kolbesen, BO .

THIN SOLID FILMS, 2003, 437 (1-2) :108-115

[3]

Cullity B.D., 1956, ELEMENTS XRAY DIFFRA

[4] CUBIC TANTALUM MONONITRIDE (B1) AND ITS MISCIBILITY WITH ISOTYPIC MONONITRIDES AND MONOCARBIDES OF 4A-GROUP AND 5A-GROUP METALS [J].

GATTERER, J ;

DUFEK, G ;

ETTMAYER, P ;

KIEFFER, R .

MONATSHEFTE FUR CHEMIE, 1975, 106 (05) :1137-1147

[5] The impact of substrate properties and thermal annealing on tantalum nitride thin films [J].

Grosser, M. ;

Muench, M. ;

Seidel, H. ;

Bienert, C. ;

Roosen, A. ;

Schmid, U. .

APPLIED SURFACE SCIENCE, 2012, 258 (07) :2894-2900

[6] Phase composition and thermal stability of arc evaporated Ti1 - xAlxN hard coatings with 0.4 ≤ x ≤ 0.67 [J].

Grossmann, Birgit ;

Schalk, Nina ;

Czettl, Christoph ;

Pohler, Markus ;

Mitterer, Christian .

SURFACE & COATINGS TECHNOLOGY, 2017, 309 :687-693

[7] Alloying-related trends from first principles: An application to the Ti-Al-X-N system [J].

Holec, David ;

Zhou, Liangcai ;

Rachbauer, Richard ;

Mayrhofer, Paul H. .

JOURNAL OF APPLIED PHYSICS, 2013, 113 (11)

[8] Origin of high temperature oxidation resistance of Ti-Al-Ta-N coatings [J].

Hollerweger, R. ;

Riedl, H. ;

Paulitsch, J. ;

Arndt, M. ;

Rachbauer, R. ;

Polcik, P. ;

Primig, S. ;

Mayrhofer, P. H. .

SURFACE & COATINGS TECHNOLOGY, 2014, 257 :78-86

[9] Mechanical properties and machining performance of Ti1-xAlxN-coated cutting tools [J].

Hörling, A ;

Hultman, L ;

Odén, M ;

Sjölén, J ;

Karlsson, L .

SURFACE & COATINGS TECHNOLOGY, 2005, 191 (2-3) :384-392

[10] Thermal stability of arc evaporated high aluminum-conteht Ti1-xAlxN thin films [J].

Hörling, A ;

Hultman, L ;

Odén, M ;

Sjölén, J ;

Karlsson, L .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (05) :1815-1823

← 1 2 3 →