Electrical and optical characterization of ion-implanted CuGaSe2 single crystals

被引:14
作者
Schon, JH
Arushanov, E
Kulyuk, LL
Micu, A
Shaban, D
Tezlevan, V
机构
[1] Univ Konstanz, Dept Phys, D-78434 Konstanz, Germany
[2] Moldavian Acad Sci, Inst Phys Appl, MD-2028 Kishinev, Moldova
[3] CNRS, LAAS, F-31077 Toulouse, France
关键词
D O I
10.1063/1.368194
中图分类号
O59 [应用物理学];
学科分类号
摘要
CuGaSe2 single crystals were doped with B and Ge by ion implantation and analyzed by Hall effect, photoluminescence, and reflected second harmonic generation measurements. After ion implantation the crystals exhibited a destroyed surface structure. Measurements of the band edge photoluminescence and the second harmonic generation before and after annealing clearly reflected the thermal healing of the implantation-induced crystalline defects. As expected the analysis of the electrical measurements showed the incorporation of donor levels due to implantation with B and Ge, which led to electrically compensated samples. However no n-type conductivity could be obtained. This is ascribed to self-compensation of the defects for implantation ion doses higher than 10(15) cm(-2). (C) 1998 American Institute of Physics.
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页码:1274 / 1278
页数:5
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