Exchange coupling and magnetoresistance in Co/Ir multilayers prepared by ion beam sputtering

被引:23
作者
Dinia, A
Stoeffel, M
Rahmouni, K
Stoeffler, D
van den Berg, HAM
机构
[1] ULP CNRS, UMR 046, IPCMS, GEMM, F-67037 Strasbourg, France
[2] Siemens AG, D-91052 Erlangen, Germany
来源
EUROPHYSICS LETTERS | 1998年 / 42卷 / 03期
关键词
D O I
10.1209/epl/i1998-00251-7
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A series of Co/Ir multilayers has been prepared by Ion Beam Sputtering on a glass substrate covered by a Fe(10 nm)/Ir(10 nm) buffer layer. The Co thickness has been fixed at 3 nm and the Ir thickness varied between 0.1 and 2.4 nm. X-ray diffraction patterns performed on these multilayers show an fee structure with a (111) preferential texture. The antiferromagnetic (AFM) exchange coupling and magnetoresistance show an oscillating behavior as a function of the Ir thickness with a period of about 1 nm. The first AFM peak has been observed at the 0.6 nm thick Ir spacer layer and its strength corresponds to J(AF) = -6 erg/cm(2) at 4.2 It. This interlayer coupling is strong and is supported by ab initio calculations of the magnetization. Very strong variation of the exchange coupling has been observed between room temperature and 4.2 K and is attributed to the strong intermixing at the Cc/Ir interfaces.
引用
收藏
页码:331 / 337
页数:7
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