Si-based Single-Dopant Atom Devices

被引:1
|
作者
Tabe, Michiharu [1 ]
Moraru, Daniel [1 ]
Udhiarto, Arief [1 ]
Miki, Sakito [1 ]
Anwar, Miftahul [1 ]
Kawai, Yuya [1 ]
Mizuno, Takeshi [1 ]
机构
[1] Shizuoka Univ, Res Inst Elect, Naka Ku, Hamamatsu, Shizuoka 4328561, Japan
来源
INTER ACADEMIA 2010: GLOBAL RESEARCH AND EDUCATION | 2011年 / 222卷
关键词
silicon; single-dopant; single-electron devices;
D O I
10.4028/www.scientific.net/AMR.222.205
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have recently proposed and demonstrated a new device concept, "Si-based single-dopant atom device", consisting of only one or a few dopant atoms in the channel of Si field-effect transistors. The device characteristics are determined by a dopant, which is mediating electron or hole transport between source and drain electrodes. In this paper, our recent results on electronic and photonic applications are introduced. Furthermore, single-dopant images obtained by a scanning probe microscope are also presented.
引用
收藏
页码:205 / 208
页数:4
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