Two-dimensional submicron focusing of hard X-rays by two elliptical mirrors fabricated by plasma chemical vaporization machining and elastic emission machining

To realize submicron focusing of hard X rays, elliptical mirrors were manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Line focused X-ray beam profiles of each mirror was evaluated at the 1-km-long beamline of SPring-8, and this showed nearly diffraction-limited performances were achieved. A Kirkpatrick-Bacz mirror unit equipping an automatic optical alignment system, in which the fabricated mirrors were used, was designed, constructed and confirmed to enable 200 x 200 nm(2) focusing of 15 keV X-ray.