Two-dimensional submicron focusing of hard X-rays by two elliptical mirrors fabricated by plasma chemical vaporization machining and elastic emission machining

被引：57
作者：
Yamauchi, K
Yamamura, K
Mimura, H
Sano, Y
Saito, A
Endo, K
Souvorov, A
Yabashi, M
Tamasaku, K
Ishikawa, T
Mori, Y
机构：
[1] Osaka Univ, Grad Sch Engn, Dept Precis Sci & Technol, Suita, Osaka 5650871, Japan
[2] Osaka Univ, Grad Sch Engn, Res Ctr Ultra Precis Sci & Technol, Suita, Osaka 5650871, Japan
[3] JASRI, SPring 8, Hyogo 6795148, Japan
[4] RIKEN, Spring 8, Hyogo 6795148, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2003年 / 42卷 / 11期
关键词：
ultraprecision machining; X ray mirror; plasma CVM (chemical vaporization machining); elastic emission machining (EEM); coherent X ray; hard X ray focusing; Kirkpatrick-Baez mirror; SPring; 8;
D O I：
10.1143/JJAP.42.7129
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
To realize submicron focusing of hard X rays, elliptical mirrors were manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Line focused X-ray beam profiles of each mirror was evaluated at the 1-km-long beamline of SPring-8, and this showed nearly diffraction-limited performances were achieved. A Kirkpatrick-Bacz mirror unit equipping an automatic optical alignment system, in which the fabricated mirrors were used, was designed, constructed and confirmed to enable 200 x 200 nm(2) focusing of 15 keV X-ray.
引用
收藏
页码：7129 / 7134
页数：6
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