Sputtering deposition of (BaxSr1-x)TiO3 thin films for microwave waveguide devices

被引：1
|
作者：
Kohno, T. [1 ]
Tsuchikawa, T. [1 ]
Bhakdisongkhram, G. [1 ]
Nishida, T. [1 ]
Takeda, H. [1 ]
Uchiyama, K. [1 ]
Shiosaki, T. [1 ]
机构：
[1] Nara Inst Sci & Technol, Grad Sch Mat Sci, Nara 6300101, Japan
来源：
2007 SIXTEENTH IEEE INTERNATIONAL SYMPOSIUM ON THE APPLICATIONS OF FERROELECTRICS, VOLS 1 AND 2 | 2007年
关键词：
D O I：
10.1109/ISAF.2007.4393216
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Barium strontium titanate (Ba(x), Sr(1-x))TiO(3) films are expected to be utilized for microwave integrated circuit devices; therefore, the preparation of highly crystalline BST films has been investigated. In this study, we attempted to prepare (Ba(x), Sr(1-x))TiO(3) films on MgO and sapphire substrates by sputtering under various conditions. It was revealed that BST films could be obtained at lower substrate temperatures on sapphire substrates, and sputtering gases with low oxygen composition were preferred to improve dielectric properties.
引用
收藏
页码：209 / 211
页数：3
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