24.58% total area efficiency of screen-printed, large area industrial silicon solar cells with the tunnel oxide passivated contacts (i-TOPCon) design

被引:207
作者
Chen, Daming [1 ]
Chen, Yifeng [1 ]
Wang, Zigang [1 ]
Gong, Jian [1 ]
Liu, Chengfa [1 ]
Zou, Yang [1 ]
He, Yu [1 ]
Wang, Yao [1 ]
Yuan, Ling [1 ]
Lin, Wenjie [1 ,2 ]
Xia, Rui [1 ]
Yin, Li [1 ]
Zhang, Xueling [1 ]
Xu, Guanchao [1 ]
Yang, Yang [1 ]
Shen, Hui [2 ]
Feng, Zhiqiang [1 ]
Altermatt, Pietro P. [1 ]
Verlinden, Pierre J. [1 ,2 ,3 ]
机构
[1] Trina Solar, State Key Lab Photovolta Sci & Technol, Changzhou 213031, Jiangsu, Peoples R China
[2] Sun Yat Sen Univ, Inst Solar Energy Syst, Guangzhou 510006, Peoples R China
[3] AMROCK Pty Ltd, Mclaren Vale, SA 5171, Australia
基金
国家重点研发计划;
关键词
Passivating contacts; i-TOPCon; n-type; Bifacial;
D O I
10.1016/j.solmat.2019.110258
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
We demonstrate an "industrial tunnel oxide passivated contacts" (i-TOPCon) silicon solar cell on large area n-type silicon wafers (156.75 mm x 156.75 mm). This cell has a boron diffused front emitter, a tunnel-SiOx/n(+)-poly-Si/SiNx:H structure at the rear side, and screen-printed electrodes on both sides. The passivation of the tunnel-SiOx/n(+)-poly-Si/SiNx:H structure on silicon wafers is investigated. The saturation currents J(o) of this structure on polished and textured silicon surfaces are 1.3 and 3.7 fA/cm(2), respectively. After printing the Ag contacts, the J(o) of this structure increases to 50.7 fA/cm(2) on textured silicon surfaces, which is still manageably low for metal contacts. This structure was applied to i-TOPCon solar cells, resulting in a median efficiency of 23.91%, measured in-house, and a champion efficiency of 24.58%, independently confirmed by the ISFH CalTeC in Germany. The champion efficiency was measured with total area illumination, including screen-printed fingers and busbars.
引用
收藏
页数:8
相关论文
共 34 条
[1]   Models for numerical device simulations of crystalline silicon solar cells-a review [J].
Altermatt, Pietro P. .
JOURNAL OF COMPUTATIONAL ELECTRONICS, 2011, 10 (03) :314-330
[2]   Numerical modeling of highly doped Si:P emitters based on Fermi-Dirac statistics and self-consistent material parameters [J].
Altermatt, PP ;
Schumacher, JO ;
Cuevas, A ;
Kerr, MJ ;
Glunz, SW ;
King, RR ;
Heiser, G ;
Schenk, A .
JOURNAL OF APPLIED PHYSICS, 2002, 92 (06) :3187-3197
[3]  
[Anonymous], ANN C EUR TECHN INN
[4]  
[Anonymous], SENT DEV UGUID
[5]  
[Anonymous], 6 N TYP C SI CELL PA
[6]  
[Anonymous], SILICON PROCESSING V
[7]  
[Anonymous], PV CELLTECH 2018 PEN
[8]   22.2% efficiency n-type PERT solar cell [J].
Cai, Wenhao ;
Yuan, Shengzhao ;
Sheng, Yun ;
Duan, Weiyuan ;
Wang, Zigang ;
Chen, Yifeng ;
Yang, Yang ;
Altermatt, Pietro. P. ;
Verlinden, Pierre J. ;
Feng, Zhiqiang .
PROCEEDINGS OF THE 6TH INTERNATIONAL CONFERENCE ON CRYSTALLINE SILICON PHOTOVOLTAICS (SILICONPV 2016), 2016, 92 :399-403
[9]   Mass production of industrial tunnel oxide passivated contacts (i-TOPCon) silicon solar cells with average efficiency over 23% and modules over 345 W [J].
Chen, Yifeng ;
Chen, Daming ;
Liu, Chengfa ;
Wang, Zigang ;
Zou, Yang ;
He, Yu ;
Wang, Yao ;
Yuan, Ling ;
Gong, Jian ;
Lin, Wenjie ;
Zhang, Xueling ;
Yang, Yang ;
Shen, Hui ;
Feng, Zhiqiang ;
Altermatt, Pietro P. ;
Verlinden, Pierre J. .
PROGRESS IN PHOTOVOLTAICS, 2019, 27 (10) :827-834
[10]   GENERATION 3: IMPROVED PERFORMANCE AT LOWER COST [J].
Cousins, Peter J. ;
Smith, David D. ;
Luan, Hsin-Chiao ;
Manning, Jane ;
Dennis, Tim D. ;
Waldhauer, Ann ;
Wilson, Karen E. ;
Harley, Gabriel ;
Mulligan, William P. .
35TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE, 2010, :275-278