Probing the local electronic structure of isovalent Bi atoms in InP

被引:4
作者
Krammel, C. M. [1 ]
da Cruz, A. R. [1 ]
Flatte, M. E. [1 ,2 ,3 ]
Roy, M. [4 ]
Maksym, P. A. [4 ]
Zhang, L. Y. [5 ]
Wang, K. [6 ]
Li, Y. Y. [6 ]
Wang, S. M. [6 ,7 ]
Koenraad, P. M. [1 ]
机构
[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5612 AZ Eindhoven, Netherlands
[2] Univ Iowa, Dept Phys & Astron, Iowa City, IA 52242 USA
[3] Univ Chicago, Pritzker Sch Mol Engn, Chicago, IL 60637 USA
[4] Univ Leicester, Dept Phys & Astron, Univ Rd, Leicester LE1 7RH, Leics, England
[5] Univ Shanghai Sci & Technol, Dept Phys, Shanghai 200093, Peoples R China
[6] Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
[7] Chalmers Univ Technol, Dept Microtechnol & Nanosci, S-41296 Gothenburg, Sweden
基金
欧盟地平线“2020”;
关键词
BAND-GAP; SEMICONDUCTORS; SURFACE;
D O I
10.1103/PhysRevB.101.024113
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cross-sectional scanning tunneling microscopy (X-STM) is used to experimentally study the influence of isovalent Bi atoms on the electronic structure of InP. We map the spatial pattern of the Bi impurity state, which originates from Bi atoms down to the sixth layer below the surface, in topographic, filled-state X-STM images on the natural {110} cleavage planes. The Bi impurity state has a highly anisotropic bowtielike structure and extends over several lattice sites. These Bi-induced charge redistributions extend along the < 110 > directions, which define the bowtielike structures we observe. Local tight-binding calculations reproduce the experimentally observed spatial structure of the Bi impurity state. In addition, the influence of the Bi atoms on the electronic structure is investigated in scanning tunneling spectroscopy measurements. These measurements show that Bi induces a resonant state in the valence band, which shifts the band edge toward higher energies. Furthermore, we show that the energetic position of the Bi-induced resonance and its influence on the onset of the valence band edge depend crucially on the position of the Bi atoms relative to the cleavage plane.
引用
收藏
页数:9
相关论文
共 46 条
[1]   Valence-band anticrossing in mismatched III-V semiconductor alloys [J].
Alberi, K. ;
Wu, J. ;
Walukiewicz, W. ;
Yu, K. M. ;
Dubon, O. D. ;
Watkins, S. P. ;
Wang, C. X. ;
Liu, X. ;
Cho, Y. -J. ;
Furdyna, J. .
PHYSICAL REVIEW B, 2007, 75 (04)
[2]   Configuration dependence of band-gap narrowing and localization in dilute GaAs1-xBix alloys [J].
Bannow, Lars C. ;
Rubel, Oleg ;
Badescu, Stefan C. ;
Rosenow, Phil ;
Hader, Jorg ;
Moloney, Jerome V. ;
Tonner, Ralf ;
Koch, Stephan W. .
PHYSICAL REVIEW B, 2016, 93 (20)
[3]   The electronic band structure of GaBiAs/GaAs layers: Influence of strain and band anti-crossing [J].
Batool, Z. ;
Hild, K. ;
Hosea, T. J. C. ;
Lu, X. ;
Tiedje, T. ;
Sweeney, S. J. .
JOURNAL OF APPLIED PHYSICS, 2012, 111 (11)
[4]   N incorporation in InP and band gap bowing of InNxP1-x [J].
Bi, WG ;
Tu, CW .
JOURNAL OF APPLIED PHYSICS, 1996, 80 (03) :1934-1936
[5]   Anisotropic spatial structure of deep acceptor states in GaAs and GaP [J].
Celebi, C. ;
Koenraad, P. M. ;
Silov, A. Yu. ;
Van Roy, W. ;
Monakhov, A. M. ;
Tang, J. -M. ;
Flatte, M. E. .
PHYSICAL REVIEW B, 2008, 77 (07)
[6]   Surface Induced Asymmetry of Acceptor Wave Functions [J].
Celebi, C. C. ;
Garleff, J. K. ;
Silov, A. Yu. ;
Yakunin, A. M. ;
Koenraad, P. M. ;
Van Roy, W. ;
Tang, J. -M. ;
Flatte, M. E. .
PHYSICAL REVIEW LETTERS, 2010, 104 (08)
[7]   SELF-CONSISTENT PSEUDOPOTENTIAL CALCULATION FOR THE RELAXED (110) SURFACE OF GAAS [J].
CHELIKOWSKY, JR ;
COHEN, ML .
PHYSICAL REVIEW B, 1979, 20 (10) :4150-4159
[8]   Contribution of surface resonances to scanning tunneling microscopy images: (110) surfaces of III-V semiconductors [J].
Ebert, P ;
Engels, B ;
Richard, P ;
Schroeder, K ;
Blugel, S ;
Domke, C ;
Heinrich, M ;
Urban, K .
PHYSICAL REVIEW LETTERS, 1996, 77 (14) :2997-3000
[9]  
Feenstra RM, 2007, NANOTECHNOLOGY, V18, DOI [10.1088/0957-4484/18/4/044015, 10.1088/0957-4484/18/43/435602]
[10]   Band gap of GaAs1-xBix, 0&lt;x&lt;3.6% [J].
Francoeur, S ;
Seong, MJ ;
Mascarenhas, A ;
Tixier, S ;
Adamcyk, M ;
Tiedje, T .
APPLIED PHYSICS LETTERS, 2003, 82 (22) :3874-3876