Evaluation of Grain-Boundary Conduction of Dense AlN-SiC Solid Solution by Scanning Nonlinear Dielectric Microscopy

被引:17
作者
Kobayashi, Ryota [1 ]
Tatami, Junichi [1 ]
Wakihara, Toru [1 ]
Komeya, Katsutoshi [1 ]
Meguro, Takeshi [1 ]
Tu, Rong [2 ]
Goto, Takashi [2 ]
机构
[1] Yokohama Natl Univ, Grad Sch Environm & Informat Sci, Yokohama, Kanagawa 2408501, Japan
[2] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
关键词
ALUMINUM NITRIDE; FABRICATION; CERAMICS;
D O I
10.1111/j.1551-2916.2010.04230.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Dense and elemental homogeneous 2H AlN-SiC solid solution doped with Al and C was fabricated by using spark plasma sintering. The p-type electrical conduction of the sample was confirmed by measurements of electrical conductivities and Seebeck coefficient. Dopant profiling of the sample by scanning nonlinear dielectric microscopy showed that the AlN-SiC grains respond to p-type electrical conduction. These results indicated that added Al and C were dissolved to the grains and acted as p-type dopants. In contrast, the grain boundaries did not show any response, suggesting the presence of depletion layer in the boundary.
引用
收藏
页码:4026 / 4029
页数:4
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