An X-ray photoelectron diffraction structural characterization of an epitaxial MnO ultrathin film on Pt(111)

被引：32

作者：

Rizzi, GA

Petukhov, M

Sambi, M

Zanoni, R

Perriello, L

Granozzi, G

机构：

[1] Univ Padua, INSTM, Consorzio Interuniv Sci & Tecnol Mat, Dipartimento Chim Inorgan Metallorgan & Anali, I-35131 Padua, Italy

[2] Univ Roma La Sapienza, Dipartimento Chim, I-00185 Rome, Italy

来源：

SURFACE SCIENCE | 2001年 / 482卷

关键词：

surface chemical reaction; growth; epitaxy; X-ray photoelectron spectroscopy; photoelectron diffraction measurement; metal-oxide-semiconductor (MOS) structures; metal-semiconductor magnetic thin film structures;

D O I：

10.1016/S0039-6028(01)00710-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

An epitaxial ultrathin MnO/Pt(111) film (13 Angstrom thick) has been grown by reactive UHV deposition of Mn-2(CO)(10) on Pt(111) at 200 degreesC in the presence of water. Angle scanned X-ray photoelectron diffraction (XPD) and LEED have been used to structurally characterize the film. The observed 1 x 1 LEED pattern is in accord with the bulk lattice parameter of a MnO(111) surface (3.14 Angstrom) and demonstrates that the film is ordered in the long range. Full hemispherical Ols and Mn2p XPD plots have been obtained and analysed on the basis of multiple scattering calculations. The XPD data confirm that the MnO(111) surface (as a single domain) is exposed and a best fit procedure based on a R-factor analysis provides a direct evidence for a relaxation of the outermost double layer, whose values are similar to those found in other similar systems (COO and FeO). (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：1474 / 1480

页数：7

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