An X-ray photoelectron diffraction structural characterization of an epitaxial MnO ultrathin film on Pt(111)

被引:32
|
作者
Rizzi, GA
Petukhov, M
Sambi, M
Zanoni, R
Perriello, L
Granozzi, G
机构
[1] Univ Padua, INSTM, Consorzio Interuniv Sci & Tecnol Mat, Dipartimento Chim Inorgan Metallorgan & Anali, I-35131 Padua, Italy
[2] Univ Roma La Sapienza, Dipartimento Chim, I-00185 Rome, Italy
关键词
surface chemical reaction; growth; epitaxy; X-ray photoelectron spectroscopy; photoelectron diffraction measurement; metal-oxide-semiconductor (MOS) structures; metal-semiconductor magnetic thin film structures;
D O I
10.1016/S0039-6028(01)00710-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
An epitaxial ultrathin MnO/Pt(111) film (13 Angstrom thick) has been grown by reactive UHV deposition of Mn-2(CO)(10) on Pt(111) at 200 degreesC in the presence of water. Angle scanned X-ray photoelectron diffraction (XPD) and LEED have been used to structurally characterize the film. The observed 1 x 1 LEED pattern is in accord with the bulk lattice parameter of a MnO(111) surface (3.14 Angstrom) and demonstrates that the film is ordered in the long range. Full hemispherical Ols and Mn2p XPD plots have been obtained and analysed on the basis of multiple scattering calculations. The XPD data confirm that the MnO(111) surface (as a single domain) is exposed and a best fit procedure based on a R-factor analysis provides a direct evidence for a relaxation of the outermost double layer, whose values are similar to those found in other similar systems (COO and FeO). (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1474 / 1480
页数:7
相关论文
共 50 条
  • [1] Ultrathin V films on Pt(111): a structural study by means of X-ray photoelectron spectroscopy and diffraction
    Sambi, M
    Granozzi, G
    SURFACE SCIENCE, 1999, 426 (02) : 235 - 250
  • [2] Spectroscopic and structural characterisation of a VOx (x ≈ 1) ultrathin epitaxial film on Pt (111)
    Petukhov, M
    Rizzi, GA
    Granozzi, G
    THIN SOLID FILMS, 2001, 400 (1-2) : 154 - 159
  • [3] PHOTOELECTRON DIFFRACTION STUDY OF ULTRATHIN-FILM GROWTH OF NI ON PT(111)
    SAMBI, M
    PIN, E
    GRANOZZI, G
    SURFACE SCIENCE, 1995, 340 (03) : 215 - 223
  • [4] Ultrathin film growth and spectroscopic characterization of VOx (0.8≤x≤1.3) on Pt(111)
    Petukhov, M
    Rizzi, GA
    Granozzi, G
    SURFACE SCIENCE, 2001, 490 (03) : 376 - 384
  • [5] Chemisorption geometry of NO on Rh(111) by X-ray photoelectron diffraction
    Kim, YJ
    Thevuthasan, S
    Herman, GS
    Peden, CHF
    Chambers, SA
    Belton, DN
    Permana, H
    SURFACE SCIENCE, 1996, 359 (1-3) : 269 - 279
  • [6] New application of classical X-ray diffraction methods for epitaxial film characterization
    Peterse, WJAM
    Scholte, PMLO
    Steinfort, AJ
    Tuinstra, F
    THIN SOLID FILMS, 1996, 289 (1-2) : 49 - 53
  • [7] CO adsorption on Pt(110) investigated by X-ray photoelectron diffraction
    Nowicki, M
    Emundts, A
    Pirug, G
    Bonzel, HP
    SURFACE SCIENCE, 2001, 478 (03) : 180 - 192
  • [8] Initial stages of Pt(111) electrooxidation: dynamic and structural studies by surface X-ray diffraction
    Drnec, Jakub
    Ruge, Martin
    Reikowski, Finn
    Rahn, Bjoern
    Carla, Francesco
    Felici, Roberto
    Stettner, Jochim
    Magnussen, Olaf M.
    Harrington, David A.
    ELECTROCHIMICA ACTA, 2017, 224 : 220 - 227
  • [9] Surfactant mediated heteroepitaxial growth of Ge/Si(111) probed by X-ray photoelectron diffraction
    Dreiner, S
    Westphal, C
    Sokeland, F
    Zacharias, H
    APPLIED SURFACE SCIENCE, 1998, 123 : 610 - 614
  • [10] Study of the Layer-Type BST Thin Film with X-ray Diffraction and X-ray Photoelectron Spectroscopy
    Lisinska-Czekaj, Agata
    Czekaj, Dionizy
    MATERIALS, 2022, 15 (02)