Condensation behavior of nanoscale bubbles on ArF excimer resist surface analyzed by atomic force microscope

被引:9
作者
Kawai, A [1 ]
机构
[1] Nagaoka Univ Technol, Dept Elect Engn, Nagaoka, Niigata 9402188, Japan
关键词
nanoscale bubble; atomic force microscope; immersion lithography; interaction force; Lifshitz theory; Hamaker constant; buoyancy;
D O I
10.2494/photopolymer.18.349
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
By using atomic force microscope (AFM), a nanoscale bubble (NB) formed on a film surface of ArF excimer resist can be imaged clearly in deionized water. The diameter and height of NBs observed are approximately 40 similar to 100nm and 3 similar to 8nm, respectively. By approaching the AFM tip onto the NBs, the repulsive force can be detected but the attractive force on the resist surface. The interaction analysis between the AFM tip and the ArF excimer resist surface is effective in order to identify the NBs and to distinguish from solid particles. These phenomena can be discussed on the basis of Lifshitz theory. The separation procedure of the NB is accomplished with the AFM tip. The applying load at which the NB can be separated into the minute one is approximately 5nN. Therefore, the NB is more likely to adhere to the ArF excimer resist surface than the AFM tip surface. The condensation among the NBs can be realized experimentally by the scanning with the AFM tip. Consequently, the line shape NBs of 200nm similar to 1 mu m width and 5 similar to 15 mu m length can be formed at the scanning edge of the AFM tip. The analysis of NB nature is discussed on the point of the immersion lithography.
引用
收藏
页码:349 / 354
页数:6
相关论文
共 50 条
  • [11] Nanoscale patterning of gold nanoparticles using an atomic force microscope
    Prime, D
    Paul, S
    Pearson, C
    Green, M
    Petty, MC
    MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, 2005, 25 (01): : 33 - 38
  • [12] Nanoscale indentation of polymer systems using the atomic force microscope
    Vanlandingham, MR
    McKnight, SH
    Palmese, GR
    Elings, JR
    Huang, X
    Bogetti, TA
    Eduljee, RF
    Gillespie, JW
    JOURNAL OF ADHESION, 1997, 64 (1-4) : 31 - 59
  • [13] Van der Waals interaction between polymer aggregates and substrate surface analyzed by atomic force microscope (AFM)
    Kawai, A
    Inoue, D
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (01) : 127 - 132
  • [14] Anodic oxidation lithography via atomic force microscope on organic resist layers
    Kim, Sung-Kyoung
    Lee, Haiwon
    POLYMER-KOREA, 2006, 30 (03) : 187 - 195
  • [15] SiO2 and Si nanoscale patterning with an atomic force microscope
    Klehn, B
    Kunze, U
    SUPERLATTICES AND MICROSTRUCTURES, 1998, 23 (02) : 441 - 444
  • [16] Adhesion and removal behavior of nanoscale bubble on resist film surface for immersion lithography
    Kawai, A
    Ishikawa, A
    Niiyama, T
    Harumoto, M
    Tamada, O
    Sanada, M
    Advances in Resist Technology and Processing XXII, Pt 1 and 2, 2005, 5753 : 807 - 817
  • [17] IMAGING THE HYDROXYL SURFACE OF LIZARDITE AT ATOMIC RESOLUTION WITH THE ATOMIC FORCE MICROSCOPE
    WICKS, FJ
    KJOLLER, K
    HENDERSON, GS
    CANADIAN MINERALOGIST, 1992, 30 : 83 - 91
  • [18] Adhesion and cohesion properties of dot resist patterns ranging from 84 to 364 nm diameter analyzed by direct peeling method with atomic force microscope tip
    Kawai, A
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (01) : 121 - 126
  • [19] PROBING THE INNER SURFACE OF A CAPILLARY WITH THE ATOMIC-FORCE MICROSCOPE
    BARBERI, R
    GIOCONDO, M
    BARTOLINO, R
    RIGHETTI, PG
    ELECTROPHORESIS, 1995, 16 (08) : 1445 - 1450
  • [20] Nanomachining on Si (100) surface using an atomic force microscope with a lateral force transducer
    Ichida, Y
    Morimoto, Y
    Sato, R
    Murakami, M
    NANOTECH 2003, VOL 1, 2003, : 534 - 537