Condensation behavior of nanoscale bubbles on ArF excimer resist surface analyzed by atomic force microscope

被引:9
作者
Kawai, A [1 ]
机构
[1] Nagaoka Univ Technol, Dept Elect Engn, Nagaoka, Niigata 9402188, Japan
关键词
nanoscale bubble; atomic force microscope; immersion lithography; interaction force; Lifshitz theory; Hamaker constant; buoyancy;
D O I
10.2494/photopolymer.18.349
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
By using atomic force microscope (AFM), a nanoscale bubble (NB) formed on a film surface of ArF excimer resist can be imaged clearly in deionized water. The diameter and height of NBs observed are approximately 40 similar to 100nm and 3 similar to 8nm, respectively. By approaching the AFM tip onto the NBs, the repulsive force can be detected but the attractive force on the resist surface. The interaction analysis between the AFM tip and the ArF excimer resist surface is effective in order to identify the NBs and to distinguish from solid particles. These phenomena can be discussed on the basis of Lifshitz theory. The separation procedure of the NB is accomplished with the AFM tip. The applying load at which the NB can be separated into the minute one is approximately 5nN. Therefore, the NB is more likely to adhere to the ArF excimer resist surface than the AFM tip surface. The condensation among the NBs can be realized experimentally by the scanning with the AFM tip. Consequently, the line shape NBs of 200nm similar to 1 mu m width and 5 similar to 15 mu m length can be formed at the scanning edge of the AFM tip. The analysis of NB nature is discussed on the point of the immersion lithography.
引用
收藏
页码:349 / 354
页数:6
相关论文
共 50 条
  • [1] Analysis of pattern collapse of ArF excimer laser resist by direct peeling method with atomic force microscope tip
    Kawai, A
    Moriike, N
    MICROELECTRONIC ENGINEERING, 2001, 57-8 : 683 - 692
  • [2] Interaction analysis of DI-water/Air/ArF resist system using atomic force microscope
    Niiyama, T
    Kawai, A
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2005, 18 (03) : 373 - 380
  • [3] Peeling property of resist pattern in water analyzed by atomic force microscope
    Kawai, A
    Inoue, D
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (05) : 757 - 758
  • [4] Cohesion property of polymer aggregates in resist pattern analyzed by atomic force microscope (AFM)
    Kawai, A
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2002, 15 (03) : 371 - 376
  • [5] Cohesion property of resist micro pattern analyzed by using atomic force microscope (AFM)
    Kawai, A
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2003, 16 (03) : 381 - 386
  • [6] Electrification on Condensation Surface of Micro Particles with Atomic Force Microscope (AFM)
    Kawai, Akira
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2013, 26 (06) : 705 - 706
  • [7] Analysis for collapse behavior of resist pattern in short develop time process using atomic force microscope
    Sanada, M
    Tamada, O
    Ishikawa, A
    Kawai, A
    Advances in Resist Technology and Processing XXII, Pt 1 and 2, 2005, 5753 : 988 - 995
  • [8] Analysis of adhesion behavior of micro resist pattern by direct collapse method with atomic force microscope tip
    Kawai, A
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIII, PTS 1 AND 2, 1999, 3677 : 565 - 573
  • [9] Atomic force microscope lithography with octadecyldimethyl-methoxysilane monolayer resist
    Oh, Y
    Kim, J
    Lee, H
    MOLECULAR CRYSTALS AND LIQUID CRYSTALS SCIENCE AND TECHNOLOGY SECTION A-MOLECULAR CRYSTALS AND LIQUID CRYSTALS, 1999, 337 : 7 - 12
  • [10] Effect of fluid resins on the surface roughness and topography of resin composite restorations analyzed by atomic force microscope
    dos Santos, Paulo Henrique
    Pavan, Sabrina
    Umeda Suzuki, Thais Yumi
    Fraga Briso, Andre Luiz
    Assuncao, Wirley Goncalves
    Coelho Sinhoreti, Mario Alexandre
    Correr-Sobrinho, Lourenco
    Consani, Simonides
    JOURNAL OF THE MECHANICAL BEHAVIOR OF BIOMEDICAL MATERIALS, 2011, 4 (03) : 433 - 439