New insights in photo-patterned sol-gel-derived TiO2 films

被引:39
作者
Briche, S. [1 ]
Tebby, Z. [2 ]
Riassetto, D. [1 ]
Messaoud, M. [1 ]
Gamet, E. [3 ]
Pernot, E. [1 ]
Roussel, H. [1 ]
Dellea, O. [2 ]
Jourlin, Y. [3 ]
Langlet, M. [1 ]
机构
[1] LMGP, Grenoble Inst Technol Minatec, F-38016 Grenoble, France
[2] PF D2 M CEA LITEN, F-42000 St Etienne, France
[3] Univ St Etienne, LabHC, F-42000 St Etienne, France
关键词
THIN POLYMER-FILMS; PHOTOCATALYTIC ACTIVITY; METAL NANOPARTICLES; PEN NANOLITHOGRAPHY; OXIDE-FILMS; MICROSTRUCTURES; TEXTILES; SURFACE; WATER; WETTABILITY;
D O I
10.1007/s10853-010-4949-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Specific sol-gel formulations and protocols have been adapted to the fine patterning of TiO2 films using a very simplified UVA three-step lithography method. Mechanisms occurring during the photo-patterning procedure and a post-patterning thermal treatment have been studied by Fourier transform infrared spectroscopy, atomic force microscopy, X-ray diffraction, and ellipsometry. Discussions are proposed to support the influence of the photo-patterning procedure and post-patterning treatment on the shape and the dimension of so-formed microstructures. Original additional functionalities arising from such structures are also presented.
引用
收藏
页码:1474 / 1486
页数:13
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