Using ab initio molecular dynamics based on density functional theory, we study the atomic and electronic structure, and transport properties of copper-doped germanium-based chalcogenide glasses. These mixed ionic-electronic conductor materials exhibit resistance or threshold switching under external electric field depending on slight variations of chemical composition. Understanding the origin of the transport character is essential for the functionalization of glassy chalcogenides for nanoelectronics applications. To this end, we generated atomic structures for GeX3 and GeX6 (X = S, Se, Te) at different copper concentrations and characterized the atomic origin of electronic states responsible for transport and the tendency of copper clustering as a function of metal concentration. Our results show that copper dissolution energies explain the tendency of copper to agglomerate in telluride glasses, consistent with filamentary conduction. In contrast, copper is less prone to cluster in sulfides and selenides leading to hysteresisless threshold switching where the nature of transport is dominated by electronic midgap defects derived from polar chalcogen bonds and copper atoms. Simulated I-V curves show that at least 35% by weight of copper is required to achieve the current demands of threshold-based devices for memory applications.
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Samsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
Choi, Sang-Jun
Lee, Jung-Hyun
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Samsung Elect Co Ltd, Corp Technol Operat SAIT, NF Grp, Yongin 446712, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
Lee, Jung-Hyun
Bae, Hyung-Jin
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Samsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
Bae, Hyung-Jin
Yang, Woo-Young
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Samsung Elect Co Ltd, Corp Technol Operat SAIT, NF Grp, Yongin 446712, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
Yang, Woo-Young
Kim, Tae-Wan
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Sejong Univ, Dept Adv Mat Engn, Seoul 143747, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
Kim, Tae-Wan
Kim, Ki-Hong
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Samsung Elect Co Ltd, Corp Technol Operat SAIT, AE Grp, Yongin 446712, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
Choi, Sang-Jun
Lee, Jung-Hyun
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h-index: 0
机构:
Samsung Elect Co Ltd, Corp Technol Operat SAIT, NF Grp, Yongin 446712, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
Lee, Jung-Hyun
Bae, Hyung-Jin
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h-index: 0
机构:
Samsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
Bae, Hyung-Jin
Yang, Woo-Young
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h-index: 0
机构:
Samsung Elect Co Ltd, Corp Technol Operat SAIT, NF Grp, Yongin 446712, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
Yang, Woo-Young
Kim, Tae-Wan
论文数: 0引用数: 0
h-index: 0
机构:
Sejong Univ, Dept Adv Mat Engn, Seoul 143747, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea
Kim, Tae-Wan
Kim, Ki-Hong
论文数: 0引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Corp Technol Operat SAIT, AE Grp, Yongin 446712, South KoreaSamsung Elect Co Ltd, Semicond R&D Ctr, Device Architecture Lab, Yongin 446712, South Korea