A Large σVTH/VDD Tolerant Zigzag 8T SRAM With Area-Efficient Decoupled Differential Sensing and Fast Write-Back Scheme

被引:53
作者
Wu, Jui-Jen [1 ]
Chen, Yen-Huei [1 ]
Chang, Meng-Fan [1 ]
Chou, Po-Wei [1 ]
Chen, Chien-Yuan [1 ]
Liao, Hung-Jen [2 ]
Chen, Ming-Bin [1 ]
Chu, Yuan-Hua [3 ]
Wu, Wen-Chin [3 ]
Yamauchi, Hiroyuki [4 ]
机构
[1] Natl Tsing Hua Univ, Dept Elect Engn, Hsinchu 30013, Taiwan
[2] Taiwan Semicond Mfg Co, DTP, Hsinchu, Taiwan
[3] Ind Technol Res Inst, Informat & Commun Res Labs ICL, Hsinchu, Taiwan
[4] Fukuoka Inst Technol, Dept Informat Engn, Fukuoka 8110295, Japan
关键词
Low supply voltage; SRAM; read disturb; static noise margin; write margin; CMOS TECHNOLOGY; POWER; CELL; OPERATION; DESIGN; CHIP;
D O I
10.1109/JSSC.2011.2109440
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Nanometer SRAM cannot achieve lower VDDmin due to read-disturb, half-select disturb and write failure. This paper demonstrates quantitative performance advantages of a zigzag 8T-SRAM (Z8T) cell over the decoupled single-ended sensing 8T-SRAM (DS8T) with write-back schemes, which was previously recognized as the most area-efficient cell under large sigma V-TH/VDD conditions. Since Z8T uses only 1T for each decoupled read-port, faster 2T differential sensing ((DS)-S-2) can be implemented within the same area as the single-ended DS8T. Thanks to (DS)-S-2, Z8T cell enables much faster R/W speed at VDDmin than DS8T. For the same VDDmin/speed, Z8T reduces the cell area by 15%. The Z8T 32 Kb macro is 14% smaller area and 53% faster than DS8T cells. Three macros were fabricated using foundry provided 65 nm low-power and 90 nm generic processes. The measured VDDmin for a 65 nm 256-row 32 Kb and a 32-row 4 Kb macro are 430 mV and 250 mV respectively. The measured VDDmin for a 90 nm 256-row 64 Kb macro is 230 mV.
引用
收藏
页码:815 / 827
页数:13
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