Time-Dependent Negative Capacitance Effects in Al2O3/BaTiO3 Bilayers

被引:76
作者
Kim, Yu Jin [1 ,2 ]
Yamada, Hiroyuki [3 ,4 ]
Moon, Taehwan [1 ,2 ]
Kwon, Young Jae [1 ,2 ]
An, Cheol Hyun [1 ,2 ]
Kim, Han Joon [1 ,2 ]
Do Kim, Keum [1 ,2 ]
Lee, Young Hwan [1 ,2 ]
Hyun, Seung Dam [1 ,2 ]
Park, Mm Hyuk [1 ,2 ]
Hwang, Cheol Seong [1 ,2 ]
机构
[1] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151744, South Korea
[2] Seoul Natl Univ, Interuniv Semicond Res Ctr, Seoul 151744, South Korea
[3] Natl Inst Adv Ind Sci & Technol, Higashi 1-1-1, Tsukuba, Ibaraki 3058562, Japan
[4] JST, PRESTO, Higashi 1-1-1, Tsukuba, Ibaraki 3058562, Japan
基金
新加坡国家研究基金会;
关键词
Negative capacitance; ferroelectrics thin films; depolarization field; low-power devices; hysteresis; charge injection; THIN-FILMS; FERROELECTRIC CAPACITOR; ROOM-TEMPERATURE; IMPRINT; VOLTAGE; DEVICES; MEMORY;
D O I
10.1021/acs.nanolett.6b01480
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The negative capacitance (NC) effects in ferroelectric materials have emerged as the possible solution to low-power transistor devices and high-charge-density capacitors. Although the steep switching characteristic (subthreshold swing < sub-60 mV/dec) has been demonstrated in various devices combining the conventional transistors with ferroelectric gates, the actual applications of the NC effects are still some way off owing to the inherent hysteresis problem. This work reinterpreted the hysteretic properties of the NC effects within the time domain and demonstrated that capacitance (charge) boosting could be achieved without the hysteresis from the Al2O3/BaTiO3 bilayer capacitors through short-pulse charging. This work revealed that the hysteresis phenomenon in NC devices originated from the dielectric leakage of the dielectric layer. The suppression of charge injection via the dielectric leakage, which usually takes time, inhibits complete ferroelectric polarization switching during a short pulse time. It was demonstrated that a nonhysteretic NC effect can be achieved only within certain limited time and voltage ranges, but that these are sufficient for critical device applications.
引用
收藏
页码:4375 / 4381
页数:7
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