Design of X-ray interferometer for phase-contrast X-ray microtomography

被引：0

作者：

Momose, A ^{[1
]}

Hirano, K ^{[1
]}

机构：

[1] Hitachi Ltd, Adv Res Lab, Hatoyama, Saitama 3500395, Japan

来源：

X-RAY MICROSCOPY, PROCEEDINGS | 2000年 / 507卷

关键词：

D O I：

暂无

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We tested an X-ray interferometer fabricated to improve the spatial resolution of phase-contrast X-ray computed tomography (CT). The main factor limiting the spatial resolution is the diffraction phenomenon in the crystal wafer of the interferometer. Improvement of the spatial resolution was attempted by thinning the wafer. A preliminary test was performed by checking interference patterns. Thinning the wafer from 1 to 0.24 mm showed clear improvement in the image quality.

引用

页码：98 / 103

页数：6

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