Development of a femtosecond micromachining workstation by use of spectral interferometry

被引：17
作者：
Bera, S [1 ]
Sabbah, AJ [1 ]
Durfee, CG [1 ]
Squier, JA [1 ]
机构：
[1] Colorado Sch Mines, Dept Phys, Golden, CO 80401 USA
来源：
OPTICS LETTERS | 2005年 / 30卷 / 04期
关键词：
D O I：
10.1364/OL.30.000373
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A workstation that permits real-time measurement of ablation depth while micromachining with femtosecond laser pulses is demonstrated. This method incorporates the unamplified pulse train that is available in a chirped-pulse amplification system as the probe in an arrangement that uses spectral interferometry to measure the ablation depth while cutting with the amplified pulse in thin metal films. (C) 2005 Optical Society of America.
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收藏
页码：373 / 375
页数：3
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