Recent results with the 6GHz flat-b ECR ion source at ORNL-HRIBF

被引：0

作者：

Liu, Y. ^{[1
]}

Kawai, Y.

Alton, G. D.

机构：

[1] Oak Ridge Natl Lab, Oak Ridge, TN 37831 USA

[2] AccSys Technol, Pleasanton, CA 94566 USA

来源：

HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION | 2007年 / 31卷

关键词：

ECR ion source; flat-B configuration; multi-charged ions; broadband microwave; emittance;

D O I：

暂无

中图分类号：

O57 [原子核物理学、高能物理学];

学科分类号：

070202 ;

摘要：

Experimental studies were conducted to characterize and improve the performance of the flat-B ECR ion source. The emittance of the source was investigated for the first time. The output beam currents of high-charge-states of Ar (q > 8) were nearly doubled by increasing the plasma electrode aperture from 4mm. to 6mm in diameter. To investigate possible enhancements with broadband microwave radiation, a "white" Gaussian noise generator was employed with a TWT amplifier to generate microwave radiation with a bandwidth of similar to 200MHz. The performance of the flat-B ECR ion source was found to be much better with narrow bandwidth radiation when the source was operated in the flat-B region. However, the ion beam intensities and charge state distributions were improved with the broadband radiation when the source was tuned off the flat-B region.

引用

页码：80 / 84

页数：5

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