Diagnostics of microwave ECR generated plasma: Effect of contaminated reference electrode

被引：16

作者：

Kar, R. ^{[1
]}

Barve, S. A. ^{[1
]}

Singh, S. B. ^{[1
]}

Barve, D. N. ^{[1
]}

Chand, N. ^{[1
]}

Patil, D. S. ^{[1
]}

机构：

[1] Bhabha Atom Res Ctr, Div Laser & Plasma Technol, Bombay 400085, Maharashtra, India

来源：

VACUUM | 2010年 / 85卷 / 02期

关键词：

Microwave ECR plasma; Plasma diagnostics; Langmuir probes; Plasma parameters; CYLINDRICAL PROBE; LANGMUIR;

D O I：

10.1016/j.vacuum.2010.05.003

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Langmuir probe diagnostics is performed on microwave ECR generated plasma that is routinely being used in our laboratory for plasma assisted chemical vapour deposition (CVD) and metal organic chemical vapour deposition (MOCVD) applications. Diagnostics is performed on Argon plasma when the plasma generation chamber was new and also after the prolonged use of this chamber for plasma assisted CVD applications. Clear differences in the values of plasma parameters from the two cases were observed and these differences are explained. The investigations reported here clearly indicate the important role of reference electrode in plasma diagnostics experiments and also suggest that it is very important to have the proper (uncontaminated) reference electrode during plasma diagnostics particularly when measurements are performed in the contaminated chamber. (C) 2010 Elsevier Ltd. All rights reserved.

引用

页码：151 / 155

页数：5

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