Submicron X-ray diffraction

被引:86
|
作者
MacDowell, AA
Celestre, RS
Tamura, N
Spolenak, R
Valek, B
Brown, WL
Bravman, JC
Padmore, HA
Batterman, BW
Patel, JR
机构
[1] Lawrence Berkeley Natl Lab, Adv Light Source, Berkeley, CA 94720 USA
[2] Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USA
[3] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
[4] Stanford Univ, Stanford Linear Accelerator Ctr, SSRL, Stanford, CA 94309 USA
关键词
X-ray micro-diffraction; electromigration; X-ray focusing;
D O I
10.1016/S0168-9002(01)00530-7
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
At the Advanced Light Source in Berkeley we have instrumented a beam line that is devoted exclusively to X-ray micro-diffraction problems. By micro-diffraction we mean those classes of problems in Physics and Materials Science that require X-ray beam sizes in the sub-micron range. The instrument is for instance, capable of probing a sub-micron size volume inside micron-sized aluminum metal grains buried under a silicon dioxide insulating layer. The resulting Laue pattern is collected on a large area CCD detector and automatically indexed to yield the grain orientation and deviatoric (distortional) strain tensor of this sub-micron volume. A four-crystal monochromator is then inserted into the beam. which allows monochromatic light to illuminate the same part of the sample. Measurement of the diffracted photon energy allows for the determination of d spacings. The combination of white and monochromatic beam measurements allow for the determination of the total strain/stress tensor (6 components) inside each sub-micron-sized illuminated volume of the sample. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:936 / 943
页数:8
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