Photoresponse properties of Al/n-β-FeSi2 Schottky diodes using β-FeSi2 single crystals

被引:26
作者
Ootsuka, Teruhisa
Fudamoto, Yasunori
Osamura, Masato
Suemasu, Takashi
Makita, Yunosuke
Fukuzawa, Yasuhiro
Nakayama, Yasuhiko
机构
[1] Tateyama Kagaku Ind Co Ltd, Toyama 9301305, Japan
[2] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[3] Kankyo Semiconductors Co Ltd, AIST Tsukuba W, Tsukuba, Ibaraki 3058569, Japan
关键词
D O I
10.1063/1.2789706
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have clearly observed photoresponse properties in an Al/n-beta-FeSi2 structure using beta-FeSi2 single crystals grown by chemical vapor transport. A photocurrent is observed for photons with energies greater than 0.68 eV. It increases sharply with increasing photon energy and attains a maximum at approximately 0.95 eV (1.31 mu m). The photocurrent originated from the photoexcited electrons in the Al and the band-to-band photoexcited carriers in the beta-FeSi2 located under the Al contact. The photoresponsivity increased upon high-temperature annealing, reaching 58 mA/W at 0.95 eV after annealing at 800 degrees C for 8 h. (C) 2007 American Institute of Physics.
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页数:3
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