Structurally Driven Environmental Degradation of Friction in MoS2 Films

被引:22
作者
Curry, John F. [1 ]
Ohta, Taisuke [1 ]
DelRio, Frank W. [1 ]
Mantos, Philip [1 ]
Jones, Morgan R. [1 ]
Babuska, Tomas F. [1 ,2 ]
Bobbitt, N. Scott [1 ]
Argibay, Nicolas [1 ]
Krick, Brandon A. [2 ]
Dugger, Michael T. [1 ]
Chandross, Michael [1 ]
机构
[1] Sandia Natl Labs, Mat Phys & Chem Sci Ctr, Albuquerque, NM 87123 USA
[2] Florida State Univ, FAMU FSU Coll Engn, Tallahassee, FL USA
关键词
MoS2; Molecular dynamics; DFT; PEEM; KPFM; Friction mechanism; Crystallite size; Defects; MOLYBDENUM-DISULFIDE; HERTZIAN STRESS; WORK FUNCTION; LAYER MOS2; WATER; OXIDATION; HUMIDITY; SURFACE; OXYGEN; LUBRICATION;
D O I
10.1007/s11249-021-01453-7
中图分类号
TQ [化学工业];
学科分类号
0817 ;
摘要
We report an investigation of the friction mechanisms of MoS2 thin films under changing environments and contact conditions using a variety of computational and experimental techniques. Molecular dynamics simulations were used to study the effects of water and molecular oxygen on friction and bonding of MoS2 lamellae during initial sliding. Characterization via photoelectron emission microscopy (PEEM) and Kelvin probe force microscopy (KPFM) were used to determine work function changes in shear modified material within the top few nanometers of MoS2 wear scars. The work function was shown to change with contact conditions and environment, and shown by density functional theory (DFT) calculations and literature reports to be correlated with lamellae size and thickness of the basally oriented surface layer. Results from nanoscale simulations and macroscale experiments suggest that the evolution of the friction behavior of MoS2 is linked primarily to the formation or inhibition of a basally oriented, molecularly thin surface film with long-range order.
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页数:10
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