Magnetic anisotropy;
magnetic films;
magnetic recording;
MEDIA;
MICROSTRUCTURE;
D O I:
10.1109/TMAG.2010.2051449
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The uniaxial magnetic anisotropy K-u of CoPtCr-SiO2 granular perpendicular recording media increases when they are deposited on a Ru intermediate layer with high Ar gas pressure. In order to clarify the reason for the increase in K-u, we investigated the correlation between K-u of continuous CoPtCr film and the Ar gas pressure of the Ru layer. Six kinds of CoPtCr films with the compositions close to practical CoPtCr-SiO2 recording media were deposited on the Ru layer with the Ar gas pressure varying from 0.6 to 8.0 Pa. The increase in K-u of continuous CoPtCr films was confirmed. Through the investigation on microstructure using X-ray diffraction, we found that the stacking faults or the fraction of face center cubic (FCC) phase of CoPtCr grains were independent on the gas pressure of Ru while the ratio of hexagonal close packed (HCP) crystal constant c/a monotonously decreased with increasing gas pressure. We conclude that the increase in K-u of CoPtCr continuous film is mostly related to the decease of c/a due to high gas pressure of Ru layer.
机构:
Tohoku Univ, Grad Sch Engn, Dept Elect Engn, Sendai, Miyagi 9808579, JapanTohoku Univ, Grad Sch Engn, Dept Elect Engn, Sendai, Miyagi 9808579, Japan
Xia, Weixing
Murakami, Yasukazu
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机构:
Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Sendai, Miyagi 9808579, JapanTohoku Univ, Grad Sch Engn, Dept Elect Engn, Sendai, Miyagi 9808579, Japan
Murakami, Yasukazu
Shindo, Daisuke
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机构:
Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Sendai, Miyagi 9808579, JapanTohoku Univ, Grad Sch Engn, Dept Elect Engn, Sendai, Miyagi 9808579, Japan
Shindo, Daisuke
Takahashi, Migaku
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机构:
Tohoku Univ, Grad Sch Engn, Dept Elect Engn, Sendai, Miyagi 9808579, Japan
Tohoku Univ, New Ind Creat Hatchery Ctr, Sendai, Miyagi 9808579, JapanTohoku Univ, Grad Sch Engn, Dept Elect Engn, Sendai, Miyagi 9808579, Japan
机构:
Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
Matsuu, Toshimitsu
Hirata, Ken-ichiro
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机构:
Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
Hirata, Ken-ichiro
Hashimoto, Atsuto
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机构:
Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
Hashimoto, Atsuto
Matsunuma, Satoshi
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机构:
Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
Hitachi Maxell Ltd, Tsukubamirai, Ibaraki 3002496, JapanTokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
Matsunuma, Satoshi
Inoue, Tetsutaro
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机构:
Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
Hitachi Maxell Ltd, Tsukubamirai, Ibaraki 3002496, JapanTokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
Inoue, Tetsutaro
Doi, Tsugihiro
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机构:
Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
Hitachi Maxell Ltd, Tsukubamirai, Ibaraki 3002496, JapanTokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
Doi, Tsugihiro
Nakagawa, Shigeki
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机构:
Tokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, JapanTokyo Inst Technol, Dept Phys Elect, Meguro Ku, Tokyo 1528552, Japan
机构:
Tohoku Univ, Dept Elect Engn, Aoba Ku, Sendai, Miyagi 9808579, JapanTohoku Univ, Dept Elect Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
Hashimoto, Atsushi
Saito, Shin
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机构:
Tohoku Univ, Dept Elect Engn, Aoba Ku, Sendai, Miyagi 9808579, JapanTohoku Univ, Dept Elect Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
Saito, Shin
Itagaki, Norikazu
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机构:
Tohoku Univ, Dept Elect Engn, Aoba Ku, Sendai, Miyagi 9808579, JapanTohoku Univ, Dept Elect Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan
Itagaki, Norikazu
Takahashi, Migaku
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h-index: 0
机构:
Tohoku Univ, New Ind Creat Hatchery Ctr, Aoba Ku, Sendai, Miyagi 9808579, JapanTohoku Univ, Dept Elect Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan