Fractional Talbot lithography with extreme ultraviolet light

被引：19

作者：

Kim, Hyun-su ^{[1
,2
,6
]}

Li, Wei ^{[4
,5
]}

Danylyuk, Serhiy ^{[2
,3
]}

Brocklesby, William S. ^{[6
]}

Marconi, Mario C. ^{[4
,5
]}

Juschkin, Larissa ^{[1
,2
]}

机构：

[1] Rhein Westfal TH Aachen, Chair Expt Phys EUV, D-52074 Aachen, Germany

[2] JARA Fundamentals Future Informat Technol, D-52074 Aachen, Germany

[3] Rhein Westfal TH Aachen, Chair Technol Opt Syst, D-52074 Aachen, Germany

[4] Colorado State Univ, Engn Res Ctr Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA

[5] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[6] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England

来源：

OPTICS LETTERS | 2014年 / 39卷 / 24期

关键词：

TRANSMISSION; GRATINGS; LASER;

D O I：

10.1364/OL.39.006969

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Fractional Talbot effect leads to the possibility to implement patterning of structures with smaller periods than the master mask. This is particularly attractive when using short wavelength illumination in the extreme ultraviolet because of attainable resolution in the sub-100-nm range. In this Letter, we demonstrate the Talbot lithography with the fractional Talbot effect under coherent illumination generated with a capillary discharge Ne-like Ar extreme ultraviolet laser. Various spatial frequency multiplications up to 5x are achieved using a parent grating. This technique allows a fabrication of nanostructures with high-resolution patterns, which is of high interest in many applications such as the manufacturing of plasmonic surfaces and photonic devices. (C) 2014 Optical Society of America

引用

页码：6969 / 6972

页数：4

共 26 条

[1] Gain-saturated 10.9 nm tabletop laser operating at 1 Hz repetition rate [J].

Alessi, D. ;

Martz, D. H. ;

Wang, Y. ;

Berrill, M. ;

Luther, B. M. ;

Rocca, J. J. .

OPTICS LETTERS, 2010, 35 (03) :414-416

[2] MULTILEVEL PHASE GRATINGS FOR ARRAY ILLUMINATORS [J].

ARRIZON, V ;

OJEDACASTANEDA, J .

APPLIED OPTICS, 1994, 33 (25) :5925-5931

[3]

Berry MV, 1996, J MOD OPTIC, V43, P2139, DOI 10.1080/09500349608232876

[4] Broadband transmission masks, gratings and filters for extreme ultraviolet and soft X-ray lithography [J].

Brose, S. ;

Danylyuk, S. ;

Juschkin, L. ;

Dittberner, C. ;

Bergmann, K. ;

Moers, J. ;

Panaitov, G. ;

Trellenkamp, St. ;

Loosen, P. ;

Gruetzmacher, D. .

THIN SOLID FILMS, 2012, 520 (15) :5080-5085

[5] Realization of optical carpets in the Talbot and Talbot-Lau configurations [J].

Case, William B. ;

Tomandl, Mathias ;

Deachapunya, Sarayut ;

Arndt, Markus .

OPTICS EXPRESS, 2009, 17 (23) :20966-20974

[6] Scalability limits of Talbot lithography with plasma-based extreme ultraviolet sources [J].

Danylyuk, Serhiy ;

Loosen, Peter ;

Bergmann, Klaus ;

Kim, Hyun-su ;

Juschkin, Larissa .

JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2013, 12 (03)

[7] SPATIAL PERIOD DIVISION - A NEW TECHNIQUE FOR EXPOSING SUB-MICROMETER-LINEWIDTH PERIODIC AND QUASI-PERIODIC PATTERNS [J].

FLANDERS, DC ;

HAWRYLUK, AM ;

SMITH, HI .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1949-1952

[8]

Goodman J., 1996, Opt. Eng

[9] Talbot experiment re-examined:: study of the chromatic regime and application to spectrometry [J].

Guérineau, N ;

Di Mambro, E ;

Primot, J ;

Alves, F .

OPTICS EXPRESS, 2003, 11 (24) :3310-3319

[10] X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92 [J].

HENKE, BL ;

GULLIKSON, EM ;

DAVIS, JC .

ATOMIC DATA AND NUCLEAR DATA TABLES, 1993, 54 (02) :181-342

← 1 2 3 →