Pulsed-laser deposition and characterization of thin films

被引：0

作者：

Bäuerle, D ^{[1
]}

Dinescu, M ^{[1
]}

Dinu, R ^{[1
]}

Pedarnig, J ^{[1
]}

Heitz, J ^{[1
]}

Schwödiauer, R ^{[1
]}

Bauer, S ^{[1
]}

Bauer-Gogonea, S ^{[1
]}

机构：

[1] Johannes Kepler Univ Linz, A-4040 Linz, Austria

来源：

PIEZOELECTRIC MATERIALS: ADVANCES IN SCIENCE, TECHNOLOGY AND APPLICATIONS | 2000年 / 76卷

关键词：

D O I：

暂无

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Pulsed-laser deposition (PLD) has become a very popular technique for the fabrication of thin films of multicomponent materials. Among the materials studied in most detail are compound semiconductors, dielectrics, ferroelectrics, electrooptic and giant magnetoresistance oxides, high-temperature superconductors, polymers, and various types of heterostructures. PLD is very reliable, offers great experimental versatility, it is fairly simple and fast - as long as small-area films of up to several square-centimeters are to be fabricated. For these reasons, PLD is particularly suitable in materials research and development. The strong non-equilibrium conditions in PLD allow, however, some unique applications: Among those are metastable materials that cannot be synthesized by standard techniques and the fabrication of films from species that are generated only during pulsed-laser ablation. With certain systems, the physical properties of such films are superior to those fabricated by standard evaporation, electron-beam evaporation, etc. This paper gives an overview on the fundamentals and applications of PLD with special emphasis on dielectric and piezoelectric thin films.

引用

页码：261 / 271

页数：11

共 32 条

[1] Uniform target ablation in pulsed-laser deposition [J].