An integrated tunable band-pass filter using MEMS parallel-plate variable capacitors implemented with 0.35μm CMOS technology

被引:18
作者
Fouladi, S. [1 ]
Bakri-Kassem, M. [1 ]
Mansour, R. R. [1 ]
机构
[1] Univ Waterloo, Waterloo, ON N2L 3G1, Canada
来源
2007 IEEE/MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-6 | 2007年
关键词
CMOS; Integrated tunable filters; microelectromechanical devices; RF MEEMS; tunable capacitors;
D O I
10.1109/MWSYM.2007.380518
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents an integrated tunable bandpass filter with RF MENIS varactors fabricated using the TSMC 0.35 mu m CMOS process. A maskless post-processing technique is developed which enables the fabrication of RF MENIS parallel-plate capacitors with a high quality factor and a very compact size. A 2-pole coupled line tunable bandpass filter with a center frequency of 9.5GRz and a 9% relative bandwidth is designed, fabricated and tested. A tuning range of 17% is achieved using integrated variable MENIS capacitors with a quality factor exceeding 20. The filter has an insertion loss of 5.66dB and occupies a chip area of 1.2 x 2.1 mm(2).
引用
收藏
页码:505 / 508
页数:4
相关论文
共 4 条
  • [1] Implementation of second-order Ku-band chip filter on si substrate with commercial 0.18 μm CMOS technology
    Chiang, Y. -C.
    Chin, H. -C.
    Hsieh, W. -L.
    [J]. 2006 IEEE MTT-S INTERNATIONAL MICROWAVE SYMPOSIUM DIGEST, VOLS 1-5, 2006, : 1249 - +
  • [2] K-band MMIC active band-pass filters
    Fan, KW
    Weng, CC
    Tsai, ZM
    Wang, H
    Jeng, SK
    [J]. IEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS, 2005, 15 (01) : 19 - 21
  • [3] FEDDER GK, 2005, IEEE SOLID STATE CIR, V1, P390
  • [4] Oz A, 2003, IEEE MTT S INT MICR, pA97, DOI 10.1109/MWSYM.2003.1211043