Design of α-Al2O3/Cr2O3 nano-multilayered composite films with enhanced irradiation tolerance prepared by epitaxial growth at low temperature

被引：13
作者：
Zou, Jianxiong [1 ]
Dong, Yuming [2 ]
Liu, Bo [1 ]
Lin, Liwei [1 ]
Zhu, Jingjun [1 ]
Liu, Shifeng [3 ]
Li, Qiran [4 ]
Liu, Xiang [5 ]
机构：
[1] Sichuan Univ, Inst Nucl Sci & Technol, Minist Educ, Key Lab Radiat Phys & Technol, Chengdu 610064, Sichuan, Peoples R China
[2] Chinese Acad Sci, Shenzhen Inst Adv Technol, Shenzhen 518055, Peoples R China
[3] Xian Univ Architecture & Technol, Xian 710045, Shaanxi, Peoples R China
[4] INNOVICES SARL, F-92390 Villeneuve Garenne, France
[5] Southwestern Inst Phys, Chengdu 610041, Sichuan, Peoples R China
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2017年 / 406卷
基金：
中国国家自然科学基金;
关键词：
alpha-Al2O3/Cr2O3; nano-multilayered; composite films; Crystallographic template; He+ irradiation; TRITIUM PERMEATION BARRIERS; THIN-FILMS; SUBSTRATE-TEMPERATURE; RADIATION-DAMAGE; CARBON FILMS; MICROSTRUCTURE; COATINGS; TEMPLATE; NANOCOMPOSITES; DEPOSITION;
D O I：
10.1016/j.nimb.2017.04.064
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
In this paper, alpha-Al2O3/Cr2O3 nano-multilayered composite films were studied due to excellent properties of alpha-Al2O3 and template effect of Cr2O3 for the synthesis of alpha-Al2O3 at low temperature. SRIM code was used to simulate the irradiation damage of alpha-Al2O3 /Cr2O3 multilayer films with different single layer thicknesses caused by 60 keV He+, in order to find out a better design of the structure of the multilayer film. alpha-Al2O3/Cr2O3 nano-multilayered films with different single layer thickness were deposited by RF magnetron reactive sputtering on Si (100) at 400 degrees C with Cr2O3 layers as crystallographic templates. The films were injected by 60 keV He with fluences of 0.5 x 10(17), 1 x 10(17) and 2 x 10(17) He/cm(2) at temperature about 573 K to study the microstructural development and surface morphology evolution of alpha-Al2O3/alpha-Al(2)O(3)nano-multilayer films. The simulation results along with the SEM investigation indicated that to obtain better irradiation tolerance, one should design a multilayer with a high proportion of alpha-Al2O3 and more interfaces. The experimental results showed that the microstructures of the alpha-Al2O3 (100 nm)/Cr2O3 (60 nm) multilayers were nano -polycrystalline and remained stable even as the radiation fluences increase to 1 x 10(17) He/cm(2). This suggests the excellent irradiation tolerance of alpha-Al2O3 (100 nm)/Cr2O3 (60 nm) nano-multilayered composite films. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码：628 / 633
页数：6
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