The effect of orientation on structure and ferroelectric properties of Bi3.25La0.75Ti3O12 thin films

被引:15
|
作者
Kim, KT [1 ]
Kim, CI [1 ]
机构
[1] Chung Ang Univ, Sch Elect & Elect Engn, Seoul 156756, South Korea
关键词
BLT; thin film; metalorganic decomposition; ferroelectric random access memory; orientation;
D O I
10.1016/j.surfcoat.2003.08.020
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have investigated the structure and ferroelectric properties of the Bi3.25La0.75Ti3O12 (BLT) thin films on Pt(1 1 1)/Ti/SiO2/Si substrate fabricated by a metalorganic decomposition deposition. The BLT films were grown with various pyrolysis processing conditions used in the film process. Both the grain growth behavior and ferroelectric properties such as remanent polarization were found to be dependent on various orientations of the BLT thin films. As a result, the highly random oriented BLT thin films exhibited higher remanent polarization (2P(r) = 37.6 muC/cm(2)) compared with (1 1 7)-oriented BLT thin films (2P(r), = 30.3 muC/cm(2)). At the same time, the (0 0 1)-oriented BLT thin films are characterized by the lowest polarization (2P(r), = 7.7 muC/cm(2)). (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:770 / 773
页数:4
相关论文
共 50 条
  • [31] Effect of bismuth excess on the crystallization of Bi3.25La0.75Ti3O12 thin films on Pt/Ti/SiO2/Si substrates
    Kim, KT
    Kim, CI
    MICROELECTRONIC ENGINEERING, 2004, 71 (3-4) : 266 - 271
  • [32] Effect of Annealing Temperature on Bi3.25La0.75Ti3O12 Powders for Humidity Sensing Properties
    Zhang, Yong
    He, Jinping
    Yuan, Mengjiao
    Jiang, Bin
    Li, Peiwen
    Tong, Yexing
    Zheng, Xuejun
    JOURNAL OF ELECTRONIC MATERIALS, 2017, 46 (01) : 377 - 385
  • [33] Ferroelectric properties of Zr-doped Bi3.25La0.75Ti3O12 thin film deposited by RF magnetron sputtering
    Wu, Yunyi
    Yu, Jun
    Zhang, Duanming
    Zheng, Chaodan
    Wang, Yunbo
    INTEGRATED FERROELECTRICS, 2007, 94 : 37 - 46
  • [34] Preparation and electrical properties of Bi3.25Pr0.75Ti3O12 ferroelectric thin films
    D. Wu
    A.D. Li
    T. Yu
    N.B. Ming
    Applied Physics A, 2004, 78 : 95 - 99
  • [35] Microstructure and Ferroelectric Properties of Direct-Patternable Bi3.25La0.75Ti3O12 Films Prepared by Photochemical Metal-Organic Deposition
    Park, Hyeong-Ho
    Kim, Hyuncheol
    Wang, Seok-Joo
    Park, Hyung-Ho
    Kim, Tae Song
    Hill, Ross H.
    FERROELECTRICS, 2009, 386 : 14 - 21
  • [36] Fabrication of robust Bi3.25La0.75Ti3O12 thin film resistant to hydrogen damage
    Kim, CJ
    THIN SOLID FILMS, 2004, 450 (02) : 261 - 264
  • [37] Retention characteristics of V-doped Bi3.25La0.75Ti3O12 thin film
    Kim, JS
    Ahn, CW
    Lee, HJ
    Lee, SY
    Kim, IW
    Bae, JS
    Jeong, JH
    CERAMICS INTERNATIONAL, 2004, 30 (07) : 1565 - 1568
  • [38] Bi3.25La0.75Ti3O12 (BLT) nanotube capacitors for semiconductor memories
    Seo, B. I.
    Shaislamov, U. A.
    Kim, S-W.
    Kim, H-K.
    Yang, B.
    Hong, S. K.
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2007, 37 (1-2) : 274 - 278
  • [39] Effect of LaNiO3 electrode on microstructural and ferroelectric properties of Bi3.25Eu0.75Ti3O12 thin films
    Kim, Kyoung-Tae
    Kim, Chang-Il
    Kim, Jong-Gyu
    Kim, Gwan-Ha
    THIN SOLID FILMS, 2007, 515 (20-21) : 8082 - 8086
  • [40] Optoelectronic Properties of Ferroelectric Composites of Bi3.25La0.75Ti3O12 (BLT) and Co-Doped BLT Thin Films Modified by FeCo-Doped BLT
    Tang, Rui
    He, Rui
    Kim, Sangmo
    Bark, Chung Wung
    COATINGS, 2023, 13 (07)