BLT;
thin film;
metalorganic decomposition;
ferroelectric random access memory;
orientation;
D O I:
10.1016/j.surfcoat.2003.08.020
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
We have investigated the structure and ferroelectric properties of the Bi3.25La0.75Ti3O12 (BLT) thin films on Pt(1 1 1)/Ti/SiO2/Si substrate fabricated by a metalorganic decomposition deposition. The BLT films were grown with various pyrolysis processing conditions used in the film process. Both the grain growth behavior and ferroelectric properties such as remanent polarization were found to be dependent on various orientations of the BLT thin films. As a result, the highly random oriented BLT thin films exhibited higher remanent polarization (2P(r) = 37.6 muC/cm(2)) compared with (1 1 7)-oriented BLT thin films (2P(r), = 30.3 muC/cm(2)). At the same time, the (0 0 1)-oriented BLT thin films are characterized by the lowest polarization (2P(r), = 7.7 muC/cm(2)). (C) 2003 Elsevier B.V. All rights reserved.
机构:
Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
Park, Hyeong-Ho
Kim, Hyuncheol
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机构:
Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
Kim, Hyuncheol
Wang, Seok-Joo
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机构:
Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
Wang, Seok-Joo
Park, Hyung-Ho
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机构:
Yonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
Park, Hyung-Ho
Kim, Tae Song
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机构:
Korea Inst Sci & Technol, Microsyst Res Ctr, Seoul 136791, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea
Kim, Tae Song
Hill, Ross H.
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机构:
Simon Fraser Univ, Labs 4D, Burnaby, BC V5A 1S6, Canada
Simon Fraser Univ, Dept Chem, Burnaby, BC V5A 1S6, CanadaYonsei Univ, Dept Mat Sci & Engn, Seoul 120749, South Korea