Production of high-quality manganite-based films on an improved VUP-5M magnetron device

被引:13
作者
Nikolaenko, Yu. M. [1 ]
Mukhin, A. B. [1 ]
Chaika, V. A. [1 ]
Burkhovetskii, V. V. [1 ]
机构
[1] Natl Acad Sci Ukraine, Galkin Physicotech Inst, UA-83114 Donetsk, Ukraine
关键词
Substrate Holder; Thermal Shield; Powerful Heat Source; Epitaxial Film Growth; Entire Target Area;
D O I
10.1134/S1063784210080189
中图分类号
O59 [应用物理学];
学科分类号
摘要
The design of an additional thermal and electric shield intended to improve the quality (crystal lattice, thickness uniformity) of deposited films is described. This shield makes it possible to use a more powerful heat source to heat a substrate and to optimize epitaxial film growth. Simultaneously, the shield plays the role of an additional anode, which changes the plasma dynamics in the working space and homogenizes the radial distribution of the neutral particle flux density from a target to a substrate.
引用
收藏
页码:1189 / 1192
页数:4
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