Determination of the mechanical properties of thin films by digital phase shifting interferometry

被引:17
作者
Tien, CL [1 ]
Lee, CC
Tsai, YL
Sun, WS
机构
[1] Chung Shan Inst Sci & Technol, Aeronaut Syst Res Div, Taichung 407, Taiwan
[2] Natl Cent Univ, Inst Opt Sci, Chungli 320, Taiwan
关键词
thin film; stress; thermal expansion coefficient; phase shifting interferometry; ion beam sputter deposition; Zernike polynomial fitting;
D O I
10.1016/S0030-4018(01)01511-5
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A new method for the measurement of internal stress and coefficient of thermal expansion of thin oxide films is presented and investigated experimentally, that combines digital phase shifting interferometry with image-processing technique to improve the accuracy of the conventional interferometric method. The change of the deflection (or curvature) of the coated substrates by the deposited film can be obtained by the phase maps. Using the Zernike polynomial fitting algorithm, a 3-D contour plot is generated from the polynomial coefficients to visualize the deformation of the thin film. Four oxide films prepared by ion beam sputter deposition with a Kaufman-type ion source are investigated for their mechanical properties. The contribution of the proposed method is to increase the sensitivity and accuracy of the temperature-dependence stress measurements. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:325 / 331
页数:7
相关论文
共 22 条
[2]   STRESS AND RESISTIVITY CONTROL IN SPUTTERED MOLYBDENUM FILMS AND COMPARISON WITH SPUTTERED GOLD [J].
BLACHMAN, AG .
METALLURGICAL TRANSACTIONS, 1971, 2 (03) :699-&
[3]  
Campbell D. S., 1970, HDB THIN FILM TECHNO, P12
[4]  
DAVIDENKOV NN, 1961, FIZ TVERD TELA, V2, P2595
[5]   Determining mean and gradient residual stresses in thin films using micromachined cantilevers [J].
Fang, W ;
Wickert, JA .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 1996, 6 (03) :301-309
[6]   DIGITAL PHASE-SHIFTING INTERFEROMETRY - A SIMPLE ERROR-COMPENSATING PHASE CALCULATION ALGORITHM [J].
HARIHARAN, P ;
OREB, BF ;
EIJU, T .
APPLIED OPTICS, 1987, 26 (13) :2504-2506
[7]   RESIDUAL-STRESS IN SILICON-NITRIDE FILMS [J].
IRENE, EA .
JOURNAL OF ELECTRONIC MATERIALS, 1976, 5 (03) :287-298
[8]   POLYNOMIAL FIT OF INTERFEROGRAMS [J].
KIM, CJ .
APPLIED OPTICS, 1982, 21 (24) :4521-4525
[9]  
Malacara D, 1992, OPTICAL SHOP TESTING, P472
[10]   INTERNAL-STRESS AND THERMAL-EXPANSION COEFFICIENT OF GDA-SI FILMS [J].
MIYAGI, M ;
FUNAKOSHI, N .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (01) :289-290