A molecular route to dip-coated transition metal nitride thin films.

被引:0
作者
Jackson, AW [1 ]
Hector, AL [1 ]
机构
[1] Univ Southampton, Sch Chem, Southampton SO17 1BJ, Hants, England
来源
Solid-State Chemistry of Inorganic Materials V | 2005年 / 848卷
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中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
There is an increasing interest in sol-gel synthesis of nitrides. The ability to deposit films of these materials by dip- or spin-coating will increase the range of applications in which they are viable and is an important step toward general sol-gel processing of nitride materials. With transition metals, the ammono based analogue of the well established alkoxy route to gels is inherently difficult to control. Due to the basicity of the system, the overwhelming tendency is of the starting materials to favour particle growth which results in a precipitate rather than a stable emulsion, unless both environment and synthetic pathway are carefully controlled. Hence reports to date of sol-gel routes to nitrides describe production of powders. We report work on a sol-gel route to titanium nitride with the ammonolysis of titanium an-tides controlled by temperature and chemical moderators, resulting in stable emulsions useful for dip-coating.
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页码:63 / 67
页数:5
相关论文
共 11 条
[1]  
BARDLEY DC, 1960, CAN J CHEM, V40, P765
[2]   Molecular routes to metal carbides, nitrides, and oxides .2. Studies of the ammonolysis of metal dialkylamides and hexamethyldisilylamides [J].
Baxter, DV ;
Chisholm, MH ;
Gama, GJ ;
DiStasi, VF ;
Hector, AL ;
Parkin, IP .
CHEMISTRY OF MATERIALS, 1996, 8 (06) :1222-1228
[3]  
BRADLEY DC, 1963, CAN J CEM, V41, P131
[4]   AMMONOLYSIS PRODUCTS OF THE DIALKYLAMIDES OF TITANIUM, ZIRCONIUM, AND NIOBIUM AS PRECURSORS TO METAL NITRIDES [J].
BROWN, GM ;
MAYA, L .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1988, 71 (01) :78-82
[5]  
CHISHOLM MH, 1987, COMPREHENSIVE COORDI, V2, P161
[6]   MODEL STUDIES OF LOW-TEMPERATURE TITANIUM NITRIDE THIN-FILM GROWTH [J].
DUBOIS, LH .
POLYHEDRON, 1994, 13 (08) :1329-1336
[7]  
KASKEL S, 2001, ANGEW CHEM INT EDIT, V40, P2404
[8]   Electronic states and mechanical properties in transition metal nitrides [J].
Lévy, F ;
Hones, P ;
Schmid, PE ;
Sanjinés, R ;
Diserens, M ;
Wiemer, C .
SURFACE & COATINGS TECHNOLOGY, 1999, 120 :284-290
[9]   Atmospheric pressure chemical vapor deposition of titanium nitride from tetrakis (diethylamido) titanium and ammonia [J].
Musher, JN ;
Gordon, RG .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (02) :736-744
[10]  
Rovai R, 1999, ANGEW CHEM INT EDIT, V38, P2036, DOI 10.1002/(SICI)1521-3773(19990712)38:13/14<2036::AID-ANIE2036>3.0.CO