Amorphous Metal/Oxide Nanolaminate

被引：9

作者：

Cowell, E. William, III ^{[2
]}

Knutson, Christopher C. ^{[1
]}

Wager, John F. ^{[2
]}

Keszler, Douglas A. ^{[1
]}

机构：

[1] Oregon State Univ, Dept Chem, Corvallis, OR 97331 USA

[2] Oregon State Univ, Dept Elect Engn & Comp Sci, Corvallis, OR 97331 USA

来源：

ACS APPLIED MATERIALS & INTERFACES | 2010年 / 2卷 / 07期

基金：

美国国家科学基金会;

关键词：

nanolaminate; thin films; amorphous metal; oxide; XPS; interface; ATOMIC LAYER DEPOSITION; STRUCTURAL-CHARACTERIZATION; THIN; GROWTH;

D O I：

10.1021/am100283m

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Bilayers of sputtered amorphous multicomponent metal films (AMMFs) and solution deposited amorphous oxide films have been reproducibly deposited with varying thicknesses of 20, 25, and 30 nm to form ordered nanolaminates. Interdiffusion is observed at the AMMF-oxide boundary, leading to unique interface chemistries that are dictated by the nature and order of the deposition processes.

引用

页码：1811 / 1813

页数：3

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