Characteristics of YBCO Josephson junction prepared by a focused ion beam technique

被引：10

作者：

Fujimoto, M ^{[1
]}

Hayashi, K ^{[1
]}

Suzuki, K ^{[1
]}

Enomoto, Y ^{[1
]}

机构：

[1] ISTEC,SUPERCONDUCT RES LAB,KOTO KU,TOKYO 135,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1996年 / 35卷 / 1A期

关键词：

Josephson junction; focused ion beam; oxygen pressure during YBCO deposition; weak link; grain boundary;

D O I：

10.1143/JJAP.35.90

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In order to clarify the formation and working mechanism of the YBCO Josephson junction, time dependence of the junction characteristics on the oxygen pressure during YBCO deposition was observed. An MgO substrate was damaged by a focused ion beam (FIB) and then a YBCO film was deposited on the substrate. When the oxygen pressure during depositions was 200 mTorr, the junction did not show the Josephson effect. At 100 mTorr, the junction showed the Josephson effect. The transition temperature (T-c) and the c-axis lattice constant of the film did not change from 200 to 100 mTorr. Therefore, we considered that the oxygen was lacking more at the junction than in the film and a Josephson junction was formed without film degradation.

引用

页码：90 / 92

页数：3

共 8 条

[1]

DIVIN YY, 1992, APPL PHYS LETT, V62, P1295

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