Vacuum-Ultraviolet Reflectometry of Ultra-thin HfO2 Films

被引：0
|
作者：
Hurst, Jeffrey [1 ]
Vartanian, Victor [2 ]
机构：
[1] Metrosol Inc, 2101 Donley Dr,Suite 101, Austin, TX 78758 USA
[2] Int SEMATECH Mfg Initiat, Albany, NY 12203 USA
来源：
FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2009 | 2009年 / 1173卷
关键词：
Metrology; Reflectometer; Vacuum ultraviolet; SILICATE;
D O I：
暂无
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Blanket HfO2 layers, deposited with 2 to 40 ALD cycles, were measured using VUV-SR. The measured HfO2 thickness was compared to both XRR and process conditions. A linear correlation coefficient, R-2, of 0.9977 to the number of ALD HfO2 cycles demonstrated sensitivity for the thickness range studied, 1.5 to 37 angstrom, while the mean repeatability for thickness measurements (1-sigma) was 0.05 angstrom.
引用
收藏
页码：72 / +
页数：2
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