Structural and optical properties of AlInN films grown on sapphire substrates

被引:36
|
作者
Guo, Qixin [1 ]
Tanaka, Tooru [1 ]
Nishio, Mitsuhiro [1 ]
Ogawa, Hiroshi [1 ]
机构
[1] Saga Univ, Dept Elect & Elect Engn, Saga 8408502, Japan
关键词
III-V semiconductor; AlInN; crystal structure; surface morphology; optical properties;
D O I
10.1143/JJAP.47.612
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the structural and optical properties of AlInN films grown on (0001) sapphire substrates by reactive radio-frequency (rf) magnetron sputtering using aluminum and indium targets in an ambient of argon and nitrogen. X-ray diffraction analysis and atomic force microscopy show that AlInN films with a smooth surface can be obtained and that the lattice constant for the c-axis obtained from the (0002) diffraction peak of the AlInN films decreases with an increase in the Al composition x. Optical transmittance and reflectance spectra analysis reveals that the AlInN films are of a direct bandgap structure as AlN and InN. The bandgap energy of the AlInN films can be tailored by varying the ratio of the rf power of the indium target to that of the aluminiurn target.
引用
收藏
页码:612 / 615
页数:4
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