Ultra light-weight and high-resolution X-ray mirrors using DRIE and X-ray LIGA techniques for space X-ray telescopes

被引:45
作者
Ezoe, Yuichiro [1 ]
Mitsuishi, Ikuyuki [2 ]
Takagi, Utako [1 ]
Koshiishi, Masaki [2 ]
Mitsuda, Kazuhisa [2 ]
Yamasaki, Noriko Y. [2 ]
Ohashi, Takaya [1 ]
Kato, Fumiki [3 ]
Sugiyama, Susumu [3 ]
Riveros, Raul E. [4 ]
Yamaguchi, Hitomi [4 ]
Fujihira, Shinya [5 ]
Kanamori, Yoshiaki [5 ]
Morishita, Kohei [6 ]
Nakajima, Kazuo [6 ]
Maeda, Ryutaro [7 ]
机构
[1] Tokyo Metropolitan Univ, Tokyo 1920397, Japan
[2] Japan Aerosp Explorat Agcy JAXA, Inst Space & Astronaut Sci ISAS, Kanagawa 2298510, Japan
[3] Ritsumeikan Univ, Shiga 5258577, Japan
[4] Univ Florida, Gainesville, FL 32911 USA
[5] Tohoku Univ, Aoba Ku, Sendai, Miyagi 9808579, Japan
[6] Tohoku Univ, Aoba Ku, Sendai, Miyagi 9808577, Japan
[7] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058564, Japan
来源
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2010年 / 16卷 / 8-9期
关键词
SILICON; TRANSFORMATION; TRENCHES; WAFERS;
D O I
10.1007/s00542-009-0981-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We are developing novel ultra light-weight and high-resolution X-ray micro pore optics for space X-ray telescopes. In our method, curvilinear micro pore structures are firstly fabricated by silicon deep reactive ion etching (DRIE) or X-ray LIGA processes. Secondly, side walls of the micro structures are smoothed by magnetic field assisted finishing and/or hydrogen annealing techniques for high reflectivity mirrors. Thirdly, to focus parallel X-ray lights from astronomical objects, these structures are elastically or plastically bent into a spherical shape. Fourthly, the bent structures are stacked to form a multi-stage X-ray telescope. In this paper, we report on fabrication and X-ray reflection tests of silicon and nickel X-ray mirrors using the DRIE and LIGA processes, respectively. For the first time, X-ray reflections were confirmed on both of the mirrors. Estimated rms roughnesses were 5 nm and 3 nm for the silicon and nickel mirrors, respectively.
引用
收藏
页码:1633 / 1641
页数:9
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