Patchy particles by glancing angle deposition

被引：204
|
作者：
Pawar, Amar B. [1 ]
Kretzschmar, Ilona [1 ]
机构：
[1] CUNY, Dept Chem Engn, New York, NY 10031 USA
来源：
LANGMUIR | 2008年 / 24卷 / 02期
关键词：
D O I：
10.1021/la703005z
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The application of glancing angle deposition (GLAD) as a means to produce patchy particles is reported. Shadow effects are caused by neighboring particles within the particle monolayer. The patch geometry is determined by the angle of incidence of the vapor rays and the monolayer orientation. A mathematical model is used to study the patch geometry and to calculate the area of the patch. The smallest patch produced with GLAD is 3.7% of the particle surface.
引用
收藏
页码：355 / 358
页数：4
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